{"_buckets": {"deposit": "e3762176-92b5-4d26-8e82-ba8d137c63d9"}, "_deposit": {"created_by": 1, "id": "86463", "owners": [1], "pid": {"revision_id": 0, "type": "depid", "value": "86463"}, "status": "published"}, "_oai": {"id": "oai:repo.qst.go.jp:00086463", "sets": ["1"]}, "author_link": ["1056603", "1056600", "1056601", "1056602", "1056599", "1056604"], "item_8_biblio_info_7": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2022-06", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "2", "bibliographicPageStart": "021210", "bibliographicVolumeNumber": "21", "bibliographic_titles": [{"bibliographic_title": "Journal of Micro/Nanopatterning, Materials, and Metrology"}]}]}, "item_8_description_5": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "The continuous development to increase the intensity of the EUV light source for future EUV lithography is important to realize the high through put fine patterning. The ERL-FEL, which is an accelerator based light source, would be one of the candidates for this one. This paper clarifies the design concept of the ERL-FEL for EUV light source for future lithography, the delivery systems of the FEL light to multi-scanners and also future development items of the accelerator technologies and a possibility of the beyond EUV. ", "subitem_description_type": "Abstract"}]}, "item_8_relation_14": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "10.1117/1.JMM.21.2.021210", "subitem_relation_type_select": "DOI"}}]}, "item_8_relation_17": {"attribute_name": "関連サイト", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "https://doi.org/10.1117/1.JMM.21.2.021210", "subitem_relation_type_select": "DOI"}}]}, "item_8_source_id_9": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "2708-8340", "subitem_source_identifier_type": "ISSN"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "metadata only access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_14cb"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Kawata, Hiroshi"}], "nameIdentifiers": [{"nameIdentifier": "1056599", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Nakamura, Norio"}], "nameIdentifiers": [{"nameIdentifier": "1056600", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sakai, Hiroshi"}], "nameIdentifiers": [{"nameIdentifier": "1056601", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kato, Ryukou"}], "nameIdentifiers": [{"nameIdentifier": "1056602", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Ryoichi, Hajima"}], "nameIdentifiers": [{"nameIdentifier": "1056603", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Ryoichi, Hajima", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "1056604", "nameIdentifierScheme": "WEKO"}]}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "High power light source for future EUV lithography based on ERL-FEL", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "High power light source for future EUV lithography based on ERL-FEL"}]}, "item_type_id": "8", "owner": "1", "path": ["1"], "permalink_uri": "https://repo.qst.go.jp/records/86463", "pubdate": {"attribute_name": "公開日", "attribute_value": "2022-03-16"}, "publish_date": "2022-03-16", "publish_status": "0", "recid": "86463", "relation": {}, "relation_version_is_last": true, "title": ["High power light source for future EUV lithography based on ERL-FEL"], "weko_shared_id": -1}