WEKO3
アイテム
High power light source for future EUV lithography based on ERL-FEL
https://repo.qst.go.jp/records/86463
https://repo.qst.go.jp/records/86463a836c847-f778-4057-a753-fc3f286fbff4
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2022-03-16 | |||||
| タイトル | ||||||
| タイトル | High power light source for future EUV lithography based on ERL-FEL | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Kawata, Hiroshi
× Kawata, Hiroshi× Nakamura, Norio× Sakai, Hiroshi× Kato, Ryukou× Ryoichi, Hajima× Ryoichi, Hajima |
|||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | The continuous development to increase the intensity of the EUV light source for future EUV lithography is important to realize the high through put fine patterning. The ERL-FEL, which is an accelerator based light source, would be one of the candidates for this one. This paper clarifies the design concept of the ERL-FEL for EUV light source for future lithography, the delivery systems of the FEL light to multi-scanners and also future development items of the accelerator technologies and a possibility of the beyond EUV. | |||||
| 書誌情報 |
Journal of Micro/Nanopatterning, Materials, and Metrology 巻 21, 号 2, p. 021210, 発行日 2022-06 |
|||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 2708-8340 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1117/1.JMM.21.2.021210 | |||||
| 関連サイト | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | https://doi.org/10.1117/1.JMM.21.2.021210 | |||||
