@article{oai:repo.qst.go.jp:00086463,
 author = {Kawata, Hiroshi and Nakamura, Norio and Sakai, Hiroshi and Kato, Ryukou and Ryoichi, Hajima and Ryoichi, Hajima},
 issue = {2},
 journal = {Journal of Micro/Nanopatterning, Materials, and Metrology},
 month = {Jun},
 note = {The continuous development to increase the intensity of the EUV light source for future EUV lithography is important to realize the high through put fine patterning. The ERL-FEL, which is an accelerator based light source, would be one of the candidates for this one. This paper clarifies the design concept of the ERL-FEL for EUV light source for future lithography, the delivery systems of the FEL light to multi-scanners and also future development items of the accelerator technologies and a possibility of the beyond EUV.},
 title = {High power light source for future EUV lithography based on ERL-FEL},
 volume = {21},
 year = {2022}
}