{"created":"2023-05-15T15:03:54.453565+00:00","id":86463,"links":{},"metadata":{"_buckets":{"deposit":"e3762176-92b5-4d26-8e82-ba8d137c63d9"},"_deposit":{"created_by":1,"id":"86463","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"86463"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00086463","sets":["1"]},"author_link":["1056603","1056600","1056601","1056602","1056599","1056604"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2022-06","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"2","bibliographicPageStart":"021210","bibliographicVolumeNumber":"21","bibliographic_titles":[{"bibliographic_title":"Journal of Micro/Nanopatterning, Materials, and Metrology"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The continuous development to increase the intensity of the EUV light source for future EUV lithography is important to realize the high through put fine patterning. The ERL-FEL, which is an accelerator based light source, would be one of the candidates for this one. This paper clarifies the design concept of the ERL-FEL for EUV light source for future lithography, the delivery systems of the FEL light to multi-scanners and also future development items of the accelerator technologies and a possibility of the beyond EUV. ","subitem_description_type":"Abstract"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1117/1.JMM.21.2.021210","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1117/1.JMM.21.2.021210","subitem_relation_type_select":"DOI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"2708-8340","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kawata, Hiroshi"}],"nameIdentifiers":[{"nameIdentifier":"1056599","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Nakamura, Norio"}],"nameIdentifiers":[{"nameIdentifier":"1056600","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sakai, Hiroshi"}],"nameIdentifiers":[{"nameIdentifier":"1056601","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kato, Ryukou"}],"nameIdentifiers":[{"nameIdentifier":"1056602","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ryoichi, Hajima"}],"nameIdentifiers":[{"nameIdentifier":"1056603","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ryoichi, Hajima","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1056604","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"High power light source for future EUV lithography based on ERL-FEL","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"High power light source for future EUV lithography based on ERL-FEL"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2022-03-16"},"publish_date":"2022-03-16","publish_status":"0","recid":"86463","relation_version_is_last":true,"title":["High power light source for future EUV lithography based on ERL-FEL"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T16:54:34.730252+00:00"}