WEKO3
アイテム
Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials
https://repo.qst.go.jp/records/84830
https://repo.qst.go.jp/records/848308775a785-2308-494a-b88a-7f5577d9ce52
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2021-11-12 | |||||
| タイトル | ||||||
| タイトル | Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Yuji, Hosaka
× Yuji, Hosaka× Hiroki, Yamamoto× Masahiko, Ishino× Dinh, Thanhhung× Masaharu, Nishikino× Akira, Kon× Shigeki, Owada× Yuichi, Inubushi× Yuya, Kubota× Yasunari, Maekawa× Yuji, Hosaka× Hiroki, Yamamoto× Masahiko, Ishino× Dinh, Thanhhung× Masaharu, Nishikino× Yasunari, Maekawa |
|||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Irradiation effects of PMMA induced by femtosecond-pulsed extreme ultraviolet (EUV) were investigated using Soft X-ray free electron laser (SXFEL) for realization of next generation lithography. The sensitivity of PMMA upon exposure to femtosecond-pulsed SXFEL was much higher than that measured for conventional nanosecond-pulsed EUV source. This result speculates the reactions induced by femtosecond-pulsed SXFEL was different from those induced by nanosecond-pulsed EUV. | |||||
| 書誌情報 |
Journal of photopolymer Science and Technology 巻 34, 号 1, p. 95-98, 発行日 2021-11 |
|||||
| 出版者 | ||||||
| 出版者 | The Society of Photopolymer Science and Technology | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0914-9244 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.2494/photopolymer.34.95 | |||||
| 関連サイト | ||||||
| 識別子タイプ | URI | |||||
| 関連識別子 | https://www.jstage.jst.go.jp/article/photopolymer/34/1/34_95/_article/ | |||||
