@article{oai:repo.qst.go.jp:00084830,
 author = {Yuji, Hosaka and Hiroki, Yamamoto and Masahiko, Ishino and Dinh, Thanhhung and Masaharu, Nishikino and Akira, Kon and Shigeki, Owada and Yuichi, Inubushi and Yuya, Kubota and Yasunari, Maekawa and Yuji, Hosaka and Hiroki, Yamamoto and Masahiko, Ishino and Dinh, Thanhhung and Masaharu, Nishikino and Yasunari, Maekawa},
 issue = {1},
 journal = {Journal of  photopolymer Science and Technology},
 month = {Nov},
 note = {Irradiation effects of PMMA induced by femtosecond-pulsed extreme ultraviolet (EUV) were investigated using Soft X-ray free electron laser (SXFEL) for realization of next generation lithography. The sensitivity of PMMA upon exposure to femtosecond-pulsed SXFEL was much higher than that measured for conventional nanosecond-pulsed EUV source. This result speculates the reactions induced by femtosecond-pulsed SXFEL was different from those induced by nanosecond-pulsed EUV.},
 pages = {95--98},
 title = {Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials},
 volume = {34},
 year = {2021}
}