{"created":"2023-05-15T15:02:33.807062+00:00","id":84830,"links":{},"metadata":{"_buckets":{"deposit":"711c75b2-c30b-4719-9c31-ed74686d87a0"},"_deposit":{"created_by":1,"id":"84830","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"84830"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00084830","sets":["1"]},"author_link":["1023418","1023415","1023417","1023420","1023422","1023421","1023424","1023414","1023427","1023419","1023428","1023426","1023425","1023416","1023429","1023423"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2021-11","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"98","bibliographicPageStart":"95","bibliographicVolumeNumber":"34","bibliographic_titles":[{"bibliographic_title":"Journal of  photopolymer Science and Technology"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Irradiation effects of PMMA induced by femtosecond-pulsed extreme ultraviolet (EUV) were investigated using Soft X-ray free electron laser (SXFEL) for realization of next generation lithography. The sensitivity of PMMA upon exposure to femtosecond-pulsed SXFEL was much higher than that measured for conventional nanosecond-pulsed EUV source. This result speculates the reactions induced by femtosecond-pulsed SXFEL was different from those induced by nanosecond-pulsed EUV.","subitem_description_type":"Abstract"}]},"item_8_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Society of Photopolymer Science and Technology"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.34.95","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://www.jstage.jst.go.jp/article/photopolymer/34/1/34_95/_article/","subitem_relation_type_select":"URI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0914-9244","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Yuji, Hosaka"}],"nameIdentifiers":[{"nameIdentifier":"1023414","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hiroki, Yamamoto"}],"nameIdentifiers":[{"nameIdentifier":"1023415","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masahiko, Ishino"}],"nameIdentifiers":[{"nameIdentifier":"1023416","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Dinh, Thanhhung"}],"nameIdentifiers":[{"nameIdentifier":"1023417","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masaharu, Nishikino"}],"nameIdentifiers":[{"nameIdentifier":"1023418","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Akira, Kon"}],"nameIdentifiers":[{"nameIdentifier":"1023419","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shigeki, Owada"}],"nameIdentifiers":[{"nameIdentifier":"1023420","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yuichi, Inubushi"}],"nameIdentifiers":[{"nameIdentifier":"1023421","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yuya, Kubota"}],"nameIdentifiers":[{"nameIdentifier":"1023422","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yasunari, Maekawa"}],"nameIdentifiers":[{"nameIdentifier":"1023423","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yuji, Hosaka","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1023424","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hiroki, Yamamoto","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1023425","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masahiko, Ishino","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1023426","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Dinh, Thanhhung","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1023427","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masaharu, Nishikino","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1023428","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yasunari, Maekawa","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1023429","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2021-11-12"},"publish_date":"2021-11-12","publish_status":"0","recid":"84830","relation_version_is_last":true,"title":["Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T18:10:08.392525+00:00"}