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Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation
https://repo.qst.go.jp/records/82819
https://repo.qst.go.jp/records/82819acbdc213-3e4b-494e-ab04-f55d49c43e44
Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2021-04-05 | |||||
タイトル | ||||||
タイトル | Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
Kazumasa, Okamoto
× Kazumasa, Okamoto× Shunpei, Kawai× Yuta, Ikari× Shigeo, Hori× Akihiro, Konda× Koki, Ueno× Yohei, Arai× Masahiko, Ishino× Dinh, Thanhhung× Masaharu, Nishikino× Akira, Kon× Shigeki, Owada× Yuichi, Inubushi× Hiroo, Kinoshita× Takahiro, Kozawa× Masahiko, Ishino× Dinh, Thanhhung× Masaharu, Nishikino× Akira, Kon |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Efforts are being focused on increasing the power of EUV light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a critical issue. A chemically amplified resist (CAR) and a non-CAR were irradiated with 13.5-nm EUV high-flux pulses from a soft X-ray free-electron laser (FEL). In the non-CAR, the positive-tone resist (ZEP520A) exhibited lower sensitivity at high irradiation densities, while the negative-tone resist [poly(4-hydroxystyrene)] exhibited a higher sensitivity. In addition, the dose rate did not considerably affect the sensitivity of the CAR. | |||||
書誌情報 |
Applied Physics Express 巻 14, p. 066502, 発行日 2021-05 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 1882-0778 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | 10.35848/1882-0786/abfca3 | |||||
関連サイト | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://iopscience.iop.org/article/10.35848/1882-0786/abfca3/meta |