{"created":"2023-05-15T15:01:03.046461+00:00","id":82819,"links":{},"metadata":{"_buckets":{"deposit":"7a53847e-7cc4-49fd-aeeb-be86ed45f092"},"_deposit":{"created_by":1,"id":"82819","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"82819"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00082819","sets":["1"]},"author_link":["1007539","1007535","1007538","1007542","1007534","1007541","1007544","1007547","1007533","1007537","1007536","1007545","1007543","1007546","1007548","1007530","1007531","1007532","1007540"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2021-05","bibliographicIssueDateType":"Issued"},"bibliographicPageStart":"066502","bibliographicVolumeNumber":"14","bibliographic_titles":[{"bibliographic_title":"Applied Physics Express"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Efforts are being focused on increasing the power of EUV light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a critical issue. A chemically amplified resist (CAR) and a non-CAR were irradiated with 13.5-nm EUV high-flux pulses from a soft X-ray free-electron laser (FEL). In the non-CAR, the positive-tone resist (ZEP520A) exhibited lower sensitivity at high irradiation densities, while the negative-tone resist [poly(4-hydroxystyrene)] exhibited a higher sensitivity. In addition, the dose rate did not considerably affect the sensitivity of the CAR.","subitem_description_type":"Abstract"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.35848/1882-0786/abfca3","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://iopscience.iop.org/article/10.35848/1882-0786/abfca3/meta","subitem_relation_type_select":"URI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1882-0778","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kazumasa, Okamoto"}],"nameIdentifiers":[{"nameIdentifier":"1007530","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shunpei, Kawai"}],"nameIdentifiers":[{"nameIdentifier":"1007531","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yuta, Ikari"}],"nameIdentifiers":[{"nameIdentifier":"1007532","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shigeo, Hori"}],"nameIdentifiers":[{"nameIdentifier":"1007533","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Akihiro, Konda"}],"nameIdentifiers":[{"nameIdentifier":"1007534","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Koki, Ueno"}],"nameIdentifiers":[{"nameIdentifier":"1007535","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yohei, Arai"}],"nameIdentifiers":[{"nameIdentifier":"1007536","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masahiko, Ishino"}],"nameIdentifiers":[{"nameIdentifier":"1007537","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Dinh, Thanhhung"}],"nameIdentifiers":[{"nameIdentifier":"1007538","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masaharu, Nishikino"}],"nameIdentifiers":[{"nameIdentifier":"1007539","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Akira, Kon"}],"nameIdentifiers":[{"nameIdentifier":"1007540","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shigeki, Owada"}],"nameIdentifiers":[{"nameIdentifier":"1007541","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yuichi, Inubushi"}],"nameIdentifiers":[{"nameIdentifier":"1007542","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hiroo, Kinoshita"}],"nameIdentifiers":[{"nameIdentifier":"1007543","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Takahiro, Kozawa"}],"nameIdentifiers":[{"nameIdentifier":"1007544","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masahiko, Ishino","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1007545","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Dinh, Thanhhung","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1007546","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masaharu, Nishikino","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1007547","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Akira, Kon","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1007548","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2021-04-05"},"publish_date":"2021-04-05","publish_status":"0","recid":"82819","relation_version_is_last":true,"title":["Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:15:43.193149+00:00"}