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Ga2O3 power transistors: The promise, the reality, and future directions

https://repo.qst.go.jp/records/74800
https://repo.qst.go.jp/records/74800
a5997b3b-a27d-46db-a152-7e9e8d1dcdbd
Item type 会議発表用資料 / Presentation(1)
公開日 2019-03-17
タイトル
タイトル Ga2O3 power transistors: The promise, the reality, and future directions
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_c94f
資源タイプ conference object
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Hoi Wong, Man

× Hoi Wong, Man

WEKO 737859

Hoi Wong, Man

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Nakata, Yoshiaki

× Nakata, Yoshiaki

WEKO 737860

Nakata, Yoshiaki

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Chia-Hung, Lin

× Chia-Hung, Lin

WEKO 737861

Chia-Hung, Lin

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Sasaki, Kohei

× Sasaki, Kohei

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Sasaki, Kohei

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Morikawa, Yoji

× Morikawa, Yoji

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Morikawa, Yoji

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Goto, Ken

× Goto, Ken

WEKO 737864

Goto, Ken

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Takeyama, Akinori

× Takeyama, Akinori

WEKO 737865

Takeyama, Akinori

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Makino, Takahiro

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Makino, Takahiro

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Ohshima, Takeshi

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Ohshima, Takeshi

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Kuramata, Akito

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Kuramata, Akito

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Yamakoshi, Shigenobu

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Yamakoshi, Shigenobu

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Murakami, Hisashi

× Murakami, Hisashi

WEKO 737870

Murakami, Hisashi

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Kumagai, Yoshinao

× Kumagai, Yoshinao

WEKO 737871

Kumagai, Yoshinao

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Higashiwaki, Masataka

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Higashiwaki, Masataka

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Takeyama, Akinori

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Makino, Takahiro

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Ohshima, Takeshi

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抄録
内容記述タイプ Abstract
内容記述 The pursuit of Ga2O3 as an ultra-wide-bandgap (4.5–4.9 eV) semiconductor for next-generation power-switching and harsh-environment electronics has catalyzed the rapid development of
Ga2O3 metal-oxide-semiconductor field-effect transistors (MOSFETs) in recent years. Field-plated lateral depletion-mode devices demonstrated a high off-state breakdown voltage of 755 V, a large on/off current ratio of over nine orders of magnitude, dispersion-free output characteristics, stable high temperature operation, and strong gamma-ray tolerance. Enhancement-mode operation with a six-order-of-magnitude on/off current ratio was enabled by an unintentionally-doped epitaxial Ga2O3 channel that was fully depleted at zero gate bias due to a low background carrier density. Planar-gate vertical Ga2O3 MOSFETs, wherein a current blocking layer provided electrical isolation between source and drain except at an aperture opening through which drain current was conducted, demonstrated successful transistor action. Advanced transistor architectures, notably normally-off vertical devices, will further enhance the impact of Ga2O3 power electronics.
会議概要(会議名, 開催地, 会期, 主催者等)
内容記述タイプ Other
内容記述 he 2018 E-MRS Fall Meeting
発表年月日
日付 2018-09-20
日付タイプ Issued
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