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Development of soft x-ray laser irradiation beamline for ablation and damage study
https://repo.qst.go.jp/records/73153
https://repo.qst.go.jp/records/73153dcf64ec8-7c90-4758-b9c0-0bc7a00fda66
Item type | 会議発表用資料 / Presentation(1) | |||||
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公開日 | 2019-01-17 | |||||
タイトル | ||||||
タイトル | Development of soft x-ray laser irradiation beamline for ablation and damage study | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_c94f | |||||
資源タイプ | conference object | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
石野, 雅彦
× 石野, 雅彦× タンフン, ヂン× 長谷川, 登× 坂上, 和之× 東口, 武史× 市丸, 智× 畑山, 雅俊× 鷲尾, 方一× 錦野, 将元× 石野 雅彦× タンフン ヂン× 長谷川 登× 錦野 将元 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | In this presentation, we report on development of the soft x-ray laser (SXRL) irradiation system at QST. The SXRL has a wavelength of 13.9 nm, and this laser wavelength is close to the wavelength of extreme ultraviolet (EUV) lithography (λ = 13.5 nm). The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. So it is possible to examine and confirm damage/ablation thresholds of EUV optical elements and doses for sensitivity of resist materials, which have the same specifications of those in the EUV lithography. | |||||
会議概要(会議名, 開催地, 会期, 主催者等) | ||||||
内容記述タイプ | Other | |||||
内容記述 | SPIE Photonics West LASE LAMOM | |||||
発表年月日 | ||||||
日付 | 2019-02-05 | |||||
日付タイプ | Issued |