@misc{oai:repo.qst.go.jp:00073153,
 author = {石野, 雅彦 and タンフン, ヂン and 長谷川, 登 and 坂上, 和之 and 東口, 武史 and 市丸, 智 and 畑山, 雅俊 and 鷲尾, 方一 and 錦野, 将元 and 石野 雅彦 and タンフン ヂン and 長谷川 登 and 錦野 将元},
 month = {Feb},
 note = {In this presentation, we report on development of the soft x-ray laser (SXRL) irradiation system at QST. The SXRL has a wavelength of 13.9 nm, and this laser wavelength is close to the wavelength of extreme ultraviolet (EUV) lithography (λ = 13.5 nm). The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. So it is possible to examine and confirm damage/ablation thresholds of EUV optical elements and doses for sensitivity of resist materials, which have the same specifications of those in the EUV lithography., SPIE Photonics West LASE LAMOM},
 title = {Development of soft x-ray laser irradiation beamline for ablation and damage study},
 year = {2019}
}