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EUV laser irradiation system with intensity monitor
https://repo.qst.go.jp/records/72973
https://repo.qst.go.jp/records/72973dd2ac4a2-d8fd-4ac8-b698-6f2e8085c37b
| Item type | 会議発表用資料 / Presentation(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2018-10-15 | |||||
| タイトル | ||||||
| タイトル | EUV laser irradiation system with intensity monitor | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_c94f | |||||
| 資源タイプ | conference object | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
石野, 雅彦
× 石野, 雅彦× タンフン, ヂン× 長谷川, 登× Sakaue, Kazuyuki× Higashiguchi, Takeshi× Ichimaru, Satoshi× Hatayama, Masataka× Washio, Masakazu× Nishikino, Masaharu× Kawachi, Tetsuya× 石野 雅彦× タンフン ヂン× 長谷川 登× 錦野 将元× 河内 哲哉 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | In presentation, we report on development of an extreme ultraviolet (EUV) laser irradiation system at QST. EUV laser has a wavelength of 13.9 nm, and this laser wavelength is close to the wavelength of EUV lithography (λ = 13.5 nm). The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. So it is possible to examine and confirm damage/ablation thresholds of optical elements and doses for sensitivity of resist materials, which have the same specifications of those in the EUV lithography. | |||||
| 会議概要（会議名, 開催地, 会期, 主催者等） | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | 16th International Conference on X-Ray Lasers (ICXRL 2018) | |||||
| 発表年月日 | ||||||
| 日付 | 2018-10-09 | |||||
| 日付タイプ | Issued | |||||
