{"created":"2023-05-15T14:53:35.174394+00:00","id":72973,"links":{},"metadata":{"_buckets":{"deposit":"8f8b88b0-bffd-46dd-bd41-02cf6d311b34"},"_deposit":{"created_by":1,"id":"72973","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"72973"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00072973","sets":["10:28"]},"author_link":["719051","719063","719057","719050","719056","719052","719053","719059","719061","719055","719062","719058","719064","719060","719054"],"item_10005_date_7":{"attribute_name":"発表年月日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2018-10-09","subitem_date_issued_type":"Issued"}]},"item_10005_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In presentation, we report on development of an extreme ultraviolet (EUV) laser irradiation system at QST. EUV laser has a wavelength of 13.9 nm, and this laser wavelength is close to the wavelength of EUV lithography (λ = 13.5 nm). The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. So it is possible to examine and confirm damage/ablation thresholds of optical elements and doses for sensitivity of resist materials, which have the same specifications of those in the EUV lithography.","subitem_description_type":"Abstract"}]},"item_10005_description_6":{"attribute_name":"会議概要（会議名, 開催地, 会期, 主催者等）","attribute_value_mlt":[{"subitem_description":"16th International Conference on X-Ray Lasers (ICXRL 2018)","subitem_description_type":"Other"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"石野, 雅彦"}],"nameIdentifiers":[{"nameIdentifier":"719050","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"タンフン, ヂン"}],"nameIdentifiers":[{"nameIdentifier":"719051","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"長谷川, 登"}],"nameIdentifiers":[{"nameIdentifier":"719052","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sakaue, Kazuyuki"}],"nameIdentifiers":[{"nameIdentifier":"719053","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Higashiguchi, Takeshi"}],"nameIdentifiers":[{"nameIdentifier":"719054","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ichimaru, Satoshi"}],"nameIdentifiers":[{"nameIdentifier":"719055","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hatayama, Masataka"}],"nameIdentifiers":[{"nameIdentifier":"719056","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Washio, Masakazu"}],"nameIdentifiers":[{"nameIdentifier":"719057","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Nishikino, Masaharu"}],"nameIdentifiers":[{"nameIdentifier":"719058","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kawachi, Tetsuya"}],"nameIdentifiers":[{"nameIdentifier":"719059","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石野 雅彦","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719060","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"タンフン ヂン","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719061","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"長谷川 登","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719062","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"錦野 将元","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719063","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"河内 哲哉","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"719064","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference object","resourceuri":"http://purl.org/coar/resource_type/c_c94f"}]},"item_title":"EUV laser irradiation system with intensity monitor","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"EUV laser irradiation system with intensity monitor"}]},"item_type_id":"10005","owner":"1","path":["28"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-10-15"},"publish_date":"2018-10-15","publish_status":"0","recid":"72973","relation_version_is_last":true,"title":["EUV laser irradiation system with intensity monitor"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:34:06.881890+00:00"}