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Epitaxial Layer Thickness Dependence on Heavy Ion Induced Charge Collection in 4H-SiC Schottky Barrier Diodes
https://repo.qst.go.jp/records/47725
https://repo.qst.go.jp/records/4772548111be5-d04b-4777-92bc-685b7ebc9fe7
Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2017-04-20 | |||||
タイトル | ||||||
タイトル | Epitaxial Layer Thickness Dependence on Heavy Ion Induced Charge Collection in 4H-SiC Schottky Barrier Diodes | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
Makino, Takahiro
× Makino, Takahiro× Onoda, Shinobu× Hoshino, Norihiro× Tsuchida, Hidekazu× Oshima, Takeshi× 牧野 高紘× 小野田 忍× 大島 武 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The charge enhancement in SiC-Schottky Barrier Didoes (SBDs) with different epi-layer thicknesses under the condition of the single-species ion irradiation was simulated to find out the mechanism of heavy-ion-induced anomalous charge collection in SiC-SBDs. The value of ion induced charge depended on the thickness of epitaxial-layer in the SBDs. The simulation result suggests that the impact ionization is one of the key effects to lead ion induced charge enhancement. | |||||
書誌情報 |
Materials Science Forum 巻 858, p. 753-756, 発行日 2016-05 |
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出版者 | ||||||
出版者 | Trans Tech Publications, Switzerland | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 1662-9752 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | 10.4028/www.scientific.net/MSF.858.753 |