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Development of micromachining technology in ion microbeam system at TIARA, JAEA
https://repo.qst.go.jp/records/45236
https://repo.qst.go.jp/records/452366f8053dd-4a60-438b-97f3-4cf49dd8f23f
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2008-07-29 | |||||
| タイトル | ||||||
| タイトル | Development of micromachining technology in ion microbeam system at TIARA, JAEA | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Kamiya, Tomihiro
× Kamiya, Tomihiro× Satoh, Takahiro× Oikawa, Masakazu× et.al× 及川 将一 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | An ion-beam-lithography technique has been progressed in the microbeam systems at JAEA Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed. | |||||
| 書誌情報 |
Applied Radiation and Isotopes 巻 67, 号 3, p. 488-491, 発行日 2008-06 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0969-8043 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1016/j.apradiso.2008.06.021 | |||||
