@article{oai:repo.qst.go.jp:00045236,
 author = {Kamiya, Tomihiro and Satoh, Takahiro and Oikawa, Masakazu and et.al and 及川 将一},
 issue = {3},
 journal = {Applied Radiation and Isotopes},
 month = {Jun},
 note = {An ion-beam-lithography technique has been progressed in the microbeam systems at JAEA Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.},
 pages = {488--491},
 title = {Development of micromachining technology in ion microbeam system at TIARA, JAEA},
 volume = {67},
 year = {2008}
}