{"created":"2023-05-15T14:35:01.711590+00:00","id":45236,"links":{},"metadata":{"_buckets":{"deposit":"e6047906-ef68-427f-86c2-6cc15dfdecac"},"_deposit":{"created_by":1,"id":"45236","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"45236"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00045236","sets":["1"]},"author_link":["449342","449343","449341","449340","449344"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2008-06","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"3","bibliographicPageEnd":"491","bibliographicPageStart":"488","bibliographicVolumeNumber":"67","bibliographic_titles":[{"bibliographic_title":"Applied Radiation and Isotopes"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"An ion-beam-lithography technique has been progressed in the microbeam systems at JAEA Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.","subitem_description_type":"Abstract"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1016/j.apradiso.2008.06.021","subitem_relation_type_select":"DOI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0969-8043","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kamiya, Tomihiro"}],"nameIdentifiers":[{"nameIdentifier":"449340","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Satoh, Takahiro"}],"nameIdentifiers":[{"nameIdentifier":"449341","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Oikawa, Masakazu"}],"nameIdentifiers":[{"nameIdentifier":"449342","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"et.al"}],"nameIdentifiers":[{"nameIdentifier":"449343","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"及川 将一","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"449344","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Development of micromachining technology in ion microbeam system at TIARA, JAEA","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Development of micromachining technology in ion microbeam system at TIARA, JAEA"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2008-07-29"},"publish_date":"2008-07-29","publish_status":"0","recid":"45236","relation_version_is_last":true,"title":["Development of micromachining technology in ion microbeam system at TIARA, JAEA"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-16T00:06:07.802694+00:00"}