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Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials
https://repo.qst.go.jp/records/84830
https://repo.qst.go.jp/records/848308775a785-2308-494a-b88a-7f5577d9ce52
Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2021-11-12 | |||||
タイトル | ||||||
タイトル | Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
Yuji, Hosaka
× Yuji, Hosaka× Hiroki, Yamamoto× Masahiko, Ishino× Dinh, Thanhhung× Masaharu, Nishikino× Akira, Kon× Shigeki, Owada× Yuichi, Inubushi× Yuya, Kubota× Yasunari, Maekawa× Yuji, Hosaka× Hiroki, Yamamoto× Masahiko, Ishino× Dinh, Thanhhung× Masaharu, Nishikino× Yasunari, Maekawa |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Irradiation effects of PMMA induced by femtosecond-pulsed extreme ultraviolet (EUV) were investigated using Soft X-ray free electron laser (SXFEL) for realization of next generation lithography. The sensitivity of PMMA upon exposure to femtosecond-pulsed SXFEL was much higher than that measured for conventional nanosecond-pulsed EUV source. This result speculates the reactions induced by femtosecond-pulsed SXFEL was different from those induced by nanosecond-pulsed EUV. | |||||
書誌情報 |
Journal of photopolymer Science and Technology 巻 34, 号 1, p. 95-98, 発行日 2021-11 |
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出版者 | ||||||
出版者 | The Society of Photopolymer Science and Technology | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0914-9244 | |||||
DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | 10.2494/photopolymer.34.95 | |||||
関連サイト | ||||||
識別子タイプ | URI | |||||
関連識別子 | https://www.jstage.jst.go.jp/article/photopolymer/34/1/34_95/_article/ |