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Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8)
https://repo.qst.go.jp/records/80629
https://repo.qst.go.jp/records/806295e2f47c6-5c63-4ebe-b57a-78a6b8f39e5c
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2020-10-02 | |||||
| タイトル | ||||||
| タイトル | Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8) | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Mawkawa, Hiroyuki
× Mawkawa, Hiroyuki× Kudo, Hiroto× Watanabe, Takao× Yamamoto, Hiroki× Okamoto, Kazumasa× Hiroki, Yamamoto |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | We examined the synthesis, physical properties, and resist properties of the various polymers and an oligomer containing fixed hole derived from calixarenes. By the condensation reaction of p-t-butylcalix[n]arene (n = 4 and 8) with 1,4-dichloro-2-oxabutane (DCB) and 2,5-dibromoacetyloxy-2,5-dimethylhexane (DBH), the soluble polymers poly(BCA[8]-co-DCB), poly(BCA[8]-co-DBH), and poly(BCA[4]-co-DCB), and an oligomer BCA[4]-DBH were obtained. They have good physical properties (solubility, film-forming ability, high thermal stability), excellent thickness loss property, and good aciddeprotection reactivity upon ultra-violet (UV) irradiation. The resist-sensitivity in an extreme ultraviolet (EUV) exposure tool indicated that poly(BCA[8]-co-DBH) and BCA[4]-DBH were good candidate to offer higher resolution resist pattern, i.e., E0 = 5.0 mJ/cm2 [poly(BCA[8]-co-DBH] and 0.8 mJ/cm2 (BCA[4]-DBH). | |||||
| 書誌情報 |
Journal of photopolymer Science and Technology 巻 33, 号 1, p. 45-51, 発行日 2020-10 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0914-9244 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.2494/photopolymer.33.45 | |||||
| 関連サイト | ||||||
| 識別子タイプ | URI | |||||
| 関連識別子 | https://www.jstage.jst.go.jp/article/photopolymer/33/1/33_45/_article/-char/en | |||||
