{"created":"2023-05-15T14:59:25.626646+00:00","id":80629,"links":{},"metadata":{"_buckets":{"deposit":"09b39a3e-314d-4235-9b91-98bc3d4098bb"},"_deposit":{"created_by":1,"id":"80629","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"80629"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00080629","sets":["1"]},"author_link":["1011168","1011170","1011169","1011171","1011172","1011173"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2020-10","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"51","bibliographicPageStart":"45","bibliographicVolumeNumber":"33","bibliographic_titles":[{"bibliographic_title":"Journal of  photopolymer Science and Technology"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"We examined the synthesis, physical properties, and resist properties of the various polymers and an oligomer containing fixed hole derived from calixarenes. By the condensation reaction of p-t-butylcalix[n]arene (n = 4 and 8) with 1,4-dichloro-2-oxabutane (DCB) and 2,5-dibromoacetyloxy-2,5-dimethylhexane (DBH), the soluble polymers poly(BCA[8]-co-DCB), poly(BCA[8]-co-DBH), and poly(BCA[4]-co-DCB), and an oligomer BCA[4]-DBH were obtained. They have good physical properties (solubility, film-forming ability, high thermal stability), excellent thickness loss property, and good aciddeprotection reactivity upon ultra-violet (UV) irradiation. The resist-sensitivity in an extreme ultraviolet (EUV) exposure tool indicated that poly(BCA[8]-co-DBH) and BCA[4]-DBH were good candidate to offer higher resolution resist pattern, i.e., E0 = 5.0 mJ/cm2 [poly(BCA[8]-co-DBH] and 0.8 mJ/cm2 (BCA[4]-DBH).","subitem_description_type":"Abstract"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.33.45","subitem_relation_type_select":"DOI"}}]},"item_8_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://www.jstage.jst.go.jp/article/photopolymer/33/1/33_45/_article/-char/en","subitem_relation_type_select":"URI"}}]},"item_8_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0914-9244","subitem_source_identifier_type":"ISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Mawkawa, Hiroyuki"}],"nameIdentifiers":[{"nameIdentifier":"1011168","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{"nameIdentifier":"1011169","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Watanabe, Takao"}],"nameIdentifiers":[{"nameIdentifier":"1011170","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{"nameIdentifier":"1011171","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Okamoto, Kazumasa"}],"nameIdentifiers":[{"nameIdentifier":"1011172","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hiroki, Yamamoto","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"1011173","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8)","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8)"}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2020-10-02"},"publish_date":"2020-10-02","publish_status":"0","recid":"80629","relation_version_is_last":true,"title":["Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8)"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:01:15.655007+00:00"}