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  1. 原著論文

Photoluminescence properties of implanted Praseodymium into Gallium Nitride at elevated temperatures

https://repo.qst.go.jp/records/80476
https://repo.qst.go.jp/records/80476
eb5e6b7b-b115-4bcf-89e4-47e62f729948
Item type 学術雑誌論文 / Journal Article(1)
公開日 2020-09-11
タイトル
タイトル Photoluminescence properties of implanted Praseodymium into Gallium Nitride at elevated temperatures
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Sato, Shinichiro

× Sato, Shinichiro

WEKO 888421

Sato, Shinichiro

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Deki, Manato

× Deki, Manato

WEKO 888422

Deki, Manato

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Nishimura, Tomoaki

× Nishimura, Tomoaki

WEKO 888423

Nishimura, Tomoaki

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Okada, Hiroshi

× Okada, Hiroshi

WEKO 888424

Okada, Hiroshi

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Watanabe, Hirotaka

× Watanabe, Hirotaka

WEKO 888425

Watanabe, Hirotaka

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Nitta, Shugo

× Nitta, Shugo

WEKO 888426

Nitta, Shugo

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Honda, Yoshio

× Honda, Yoshio

WEKO 888427

Honda, Yoshio

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Amano, Hiroshi

× Amano, Hiroshi

WEKO 888428

Amano, Hiroshi

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 888429

Ohshima, Takeshi

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Sato, Shinichiro

× Sato, Shinichiro

WEKO 888430

en Sato, Shinichiro

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 888431

en Ohshima, Takeshi

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抄録
内容記述タイプ Abstract
内容記述 Since Rare-Earth (RE) doped Gallium Nitride (GaN) is expected to be used as electrically driven single photon source at room temperature, low dose RE-ion implantation and their activation as luminescent centers are of interest. This paper reports photoluminescence (PL) properties of Praseodymium (Pr) implanted GaN at different temperatures ranging from room temperature to 1200 °C. All the Pr-implanted GaN samples are thermally annealed after implantation and show strong PL emissions at 650.2 nm and 652.0 nm, originated from 3P0→3F2 transition in 4f-shell of Pr3+ ions. It is shown that the PL intensity originating from Pr3+ ions is reduced as the implantation temperature increases for the Pr-implanted samples annealed at 1200 °C. This result suggests that
Pr3+ ions quench due to the formation of complex defects and defect clusters. The effect of high temperature implantation on the recovery of GaN crystallinity is discussed in terms of critical dose and displacement damage.
書誌情報 Nuclear Inst. and Methods in Physics Research B

巻 479, p. 7-12, 発行日 2020-06
出版者
出版者 Elservier
ISSN
収録物識別子タイプ ISSN
収録物識別子 0168-583X
DOI
識別子タイプ DOI
関連識別子 10.1016/j.nimb.2020.06.007
関連サイト
識別子タイプ URI
関連識別子 https://www.sciencedirect.com/science/article/pii/S0168583X20302834
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