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Effect of irradiation atmospheres on the film growth of iron oxide on Si substrate by ion beam sputter deposition method
https://repo.qst.go.jp/records/80369
https://repo.qst.go.jp/records/8036931ac4b05-1030-4e2c-8936-78111ed3c5f7
| Item type | 会議発表論文 / Conference Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2019-05-21 | |||||
| タイトル | ||||||
| タイトル | Effect of irradiation atmospheres on the film growth of iron oxide on Si substrate by ion beam sputter deposition method | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_5794 | |||||
| 資源タイプ | conference paper | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
山中, 健太
× 山中, 健太× 山口, 憲司× Yamanaka, Kenta× Yamaguchi, Kenji |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Fe3O4 thin films of approximately 30 nm in thickness on Si substrate were grown at 573 K by means of ion beam sputter deposition (IBSD) technique, under oxygen and argon ion irradiations to sputter Fe3O4 solid target. It was revealed that the oxygen atmosphere improves the crystallinity of the film as compared with argon atmosphere, but also causes the formation of iron oxide phases other than Fe3O4. On the other hand, the obtained results for Fe3O4 thin films prepared in argon atmosphere had poor crystallinity. | |||||
| 書誌情報 |
JJAP Conference Proceedings 巻 8, p. 011201-1-011201-5, 発行日 2020-08 |
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| 出版者 | ||||||
| 出版者 | JJAP (応用物理学会) | |||||
| ISBN | ||||||
| 識別子タイプ | ISBN | |||||
| 関連識別子 | 978-4-86348-767-3 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.7567/JJAPCP.8.011201 | |||||
| 関連サイト | ||||||
| 識別子タイプ | URI | |||||
| 関連識別子 | https://journals.jsap.jp/jjapproceedings/online/8-011201 | |||||
