{"created":"2023-05-15T14:59:14.143491+00:00","id":80369,"links":{},"metadata":{"_buckets":{"deposit":"ebb93aff-0d52-4033-af2d-384c633c6b7c"},"_deposit":{"created_by":1,"id":"80369","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"80369"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00080369","sets":["2"]},"author_link":["883793","883791","883792","883790"],"item_10003_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2020-08","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"011201-5","bibliographicPageStart":"011201-1","bibliographicVolumeNumber":"8","bibliographic_titles":[{"bibliographic_title":"JJAP Conference Proceedings"}]}]},"item_10003_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Fe3O4 thin films of approximately 30 nm in thickness on Si substrate were grown at 573 K by means of ion beam sputter deposition (IBSD) technique, under oxygen and argon ion irradiations to sputter Fe3O4 solid target.  It was revealed that the oxygen atmosphere improves the crystallinity of the film as compared with argon atmosphere, but also causes the formation of iron oxide phases other than Fe3O4.  On the other hand, the obtained results for Fe3O4 thin films prepared in argon atmosphere had poor crystallinity. ","subitem_description_type":"Abstract"}]},"item_10003_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"JJAP (応用物理学会)"}]},"item_10003_relation_10":{"attribute_name":"ISBN","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"978-4-86348-767-3","subitem_relation_type_select":"ISBN"}}]},"item_10003_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.7567/JJAPCP.8.011201","subitem_relation_type_select":"DOI"}}]},"item_10003_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://journals.jsap.jp/jjapproceedings/online/8-011201","subitem_relation_type_select":"URI"}}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"山中, 健太"}],"nameIdentifiers":[{"nameIdentifier":"883790","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"山口, 憲司"}],"nameIdentifiers":[{"nameIdentifier":"883791","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamanaka, Kenta","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883792","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamaguchi, Kenji","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"883793","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"Effect of irradiation atmospheres on the film growth of iron oxide on Si substrate by ion beam sputter deposition method ","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Effect of irradiation atmospheres on the film growth of iron oxide on Si substrate by ion beam sputter deposition method "}]},"item_type_id":"10003","owner":"1","path":["2"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-05-21"},"publish_date":"2019-05-21","publish_status":"0","recid":"80369","relation_version_is_last":true,"title":["Effect of irradiation atmospheres on the film growth of iron oxide on Si substrate by ion beam sputter deposition method "],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T21:37:14.915120+00:00"}