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  1. 原著論文

Effects of Nitrogen Impurity Concentration on Nitrogen-Vacancy Center Formation in 4H-SiC

https://repo.qst.go.jp/records/80305
https://repo.qst.go.jp/records/80305
937be3eb-3190-4d3c-af36-64aa969635c8
Item type 学術雑誌論文 / Journal Article(1)
公開日 2020-08-07
タイトル
タイトル Effects of Nitrogen Impurity Concentration on Nitrogen-Vacancy Center Formation in 4H-SiC
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Narahara, Takuma

× Narahara, Takuma

WEKO 940153

Narahara, Takuma

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Sato, Shinichiro

× Sato, Shinichiro

WEKO 940154

Sato, Shinichiro

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Kojima, Kazutoshi

× Kojima, Kazutoshi

WEKO 940155

Kojima, Kazutoshi

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Yamazaki, Yuichi

× Yamazaki, Yuichi

WEKO 940156

Yamazaki, Yuichi

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Hijikata, Yasuto

× Hijikata, Yasuto

WEKO 940157

Hijikata, Yasuto

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 940158

Ohshima, Takeshi

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Takuma, Narahara

× Takuma, Narahara

WEKO 940159

en Takuma, Narahara

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Shinichiro, Sato

× Shinichiro, Sato

WEKO 940160

en Shinichiro, Sato

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Yuichi, Yamazaki

× Yuichi, Yamazaki

WEKO 940161

en Yuichi, Yamazaki

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Takeshi, Ohshima

× Takeshi, Ohshima

WEKO 940162

en Takeshi, Ohshima

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抄録
内容記述タイプ Abstract
内容記述 Spin defects of which states can be manipulated in Silicon Carbide (SiC) have drawn considerable attention because of their applications to quantum technologies. The single negatively-charged pairs of VSi and nitrogen atom (N) on an adjacent C site (NcVsi- center) in SiC is suitable for them. This paper reports the formation of NcVsi- centers on 4H-SiC epilayers with different nitrogen concentrations using light/heavy ion irradiation and subsequent thermal annealing. The formation of NcVsi- centers is characterized by the near infrared photoluminescence (PL) spectroscopy. It is shown that the PL intensity from NcVsi- centers depends on the N concentration and the ion irradiation conditions. The PL intensity increases monotonically with increasing the N
concentration when the N concentration is above 2.6×10^16 cm^-3 , whereas no linear correlation between them does not appear below that N concentration. Although the PL intensity increases with increasing defects induced by ion irradiation, the PL quenching due to neighboring residual defects appear at above the areal vacancy concentration of 10^17 vac/cm^2 and the broad Raman scattering spectra originated from vibration modes of amorphized regions hinder the PL from NcVsi- centers at above 10^18 vac/cm^2. The formation mechanism and the charge state stability of NcVsi- centers are discussed based on the obtained results.
書誌情報 Materials Science Forum

巻 1004, p. 349-354, 発行日 2020-08
出版者
出版者 Trans Tech Publications
ISSN
収録物識別子タイプ ISSN
収録物識別子 1662-9752
DOI
識別子タイプ DOI
関連識別子 10.4028/www.scientific.net/MSF.1004.349
関連サイト
識別子タイプ URI
関連識別子 https://www.scientific.net/MSF.1004.349
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