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Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist
https://repo.qst.go.jp/records/74709
https://repo.qst.go.jp/records/7470977e695e7-fda1-44a6-b76a-df8e7a2e6704
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2019-03-13 | |||||
| タイトル | ||||||
| タイトル | Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
山本, 洋揮
× 山本, 洋揮× Vesters, Yannick× Jing Jiang× De Simone, Danilo× Vandenberghe, Geert× Kozawa, Takahiro× Yamamoto, Hiroki |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | In this study, we investigated the effect of metal sensitizers in the resist materials on acid yields using the acid dye method. The introduction of metal sensitizer leads to higher acid generation efficiency per unit volume. In addition, the dissolution behavior and the patterning performances of the resists containing metal sensitizer were investigated using quartz crystal microbalance (QCM) and electron beam (EB) lithography system. These results indicate metal sensitizers are promising method for the improvement of resist performance. | |||||
| 書誌情報 |
Journal of Photopolymer Science and Technology 巻 31, 号 6, p. 747-751, 発行日 2019-03 |
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| 出版者 | ||||||
| 出版者 | The Society of Photopolymer Science and Technology | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0914-9244 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.2494/photopolymer.31.747 | |||||
