@article{oai:repo.qst.go.jp:00074709,
 author = {山本, 洋揮 and Vesters, Yannick and Jing Jiang and De Simone, Danilo and Vandenberghe, Geert and Kozawa, Takahiro and Yamamoto, Hiroki},
 issue = {6},
 journal = {Journal of Photopolymer Science and Technology},
 month = {Mar},
 note = {In this study, we investigated the effect of metal sensitizers in the resist materials on acid yields using the acid dye method. The introduction of metal sensitizer leads to higher acid generation efficiency per unit volume. In addition, the dissolution behavior and the patterning performances of the resists containing metal sensitizer were investigated using quartz crystal microbalance (QCM) and electron beam (EB) lithography system. These results indicate metal sensitizers are promising method for the improvement of resist performance.},
 pages = {747--751},
 title = {Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist},
 volume = {31},
 year = {2019}
}