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Effect of plasma formation on the double pulse laser excitation of cubic silicon carbide

https://repo.qst.go.jp/records/66609
https://repo.qst.go.jp/records/66609
668bbe15-2267-48a7-bbb5-3081cadaa0e2
アイテムタイプ 会議発表用資料 / Presentation(1)
公開日 2018-02-05
タイトル
タイトル Effect of plasma formation on the double pulse laser excitation of cubic silicon carbide
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_c94f
資源タイプ conference output
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 乙部, 智仁

× 乙部, 智仁

WEKO 655106

乙部, 智仁

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乙部 智仁

× 乙部 智仁

WEKO 655107

en 乙部 智仁

Search repository
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内容記述タイプ Abstract
内容記述 We calculate the electron excitation in cubic silicon carbide (3C-SiC) caused by the intense femtosecond laser double pulses
using time-dependent density functional theory (TDDFT).
After the first pulse ends, excited electrons should be relaxed by the collisional processes.
Because TDDFT dose not include the scattering processes, the thermalization is mimicked by following three assumptions.
First, we assume no collisions and relaxation processes.
Second, we assume the partially thermalized electronic state defined by two quasi-temperatures in the conduction and valence bands individually.
Third, we assume the thermalized electron distribution, which is expressed by single electron temperature.
Our results indicate that the plasma frequency formed by the first pulse is the key parameter in energy absorption in the second pulse.
When the plasma frequency is comparable to the frequency of the laser, the energy absorption in the second pulse shows maximum.
The lower electron temperature shows higher plasma frequency
and higher efficient energy absorption, because the effective mass of electron becomes smaller.
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内容記述タイプ Other
内容記述 SPIE Photonic West LASE
発表年月日
日付 2018-01-30
日付タイプ Issued
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