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Encyclopedia of Semiconductor Nanotechnology, Volume 4, Chapter 2, Molecular-beam controlled chemical reactions on Si surfaces
https://repo.qst.go.jp/records/58702
https://repo.qst.go.jp/records/58702d26ff7b0-83df-4a40-a493-6490eeb3fc41
Item type | 一般雑誌記事 / Article(1) | |||||
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公開日 | 2017-03-21 | |||||
タイトル | ||||||
タイトル | Encyclopedia of Semiconductor Nanotechnology, Volume 4, Chapter 2, Molecular-beam controlled chemical reactions on Si surfaces | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | article | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
Okada, Michio
× Okada, Michio× 寺岡, 有殿× 寺岡 有殿 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | 超音速分子線と配向分子線を用いたシリコンの表面反応について、分子線の原理、実験方法、結果と考察を詳しく解説した。 | |||||
書誌情報 |
Encyclopedia of Semiconductor Nanotechnology, Volume 4, Chapter 2, Molecular-beam controlled chemical reactions on Si surfaces 発行日 2017-03 |
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出版者 | ||||||
出版者 | American Scientific Publishers | |||||
ISBN | ||||||
識別子タイプ | ISBN | |||||
関連識別子 | 1-58883-199-X |