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Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography
https://repo.qst.go.jp/records/49612
https://repo.qst.go.jp/records/49612a87988ce-1435-482a-81f8-08819ec00522
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2019-02-12 | |||||
| タイトル | ||||||
| タイトル | Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Kudo, Hiroto
× Kudo, Hiroto× Fukunaga, Mari× Shotsuki, Kohei× Takeda, Hiroya× 山本, 洋揮× Kozawa, Takahiro× 山本 洋揮 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | We synthesized various hyperbranched polyacetals poly(t-BCRA[4]-co- BVOC), poly(t-BCRA[4]-co- BVOXP), poly(t-BCRA[4]-co-BVBC), and poly(t-BCRA[4]-co-TVCH) by the polyaddition of C-(4-t-butylbenz)calix[4]resorcinarene (t-BCRA[4]) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC), 1,3-bis(vinyloxy)propane(BVOP), 1,5-bis(vinyloxy)-3-oxapentane (BVOXP), 4,4'-bis(vinyloxy)-1,1'-bicyclohexane (BVBC), and 1,3,5,-tris(vinyloxy)cyclohexane (TVCH), respectively. The resist properties (resist sensitivies, outgassing on EUV exposure, thickness loss after soaking in aq. TMAH, and etching durability) were consistent with their structures. Overall, poly(t-BCRA[4]-co- BVOC) has a high potential as a next-generation resist material. | |||||
| 書誌情報 |
Reactive and Functional Polymers 巻 131, p. 361-367, 発行日 2018-08 |
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| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1016/j.reactfunctpolym.2018.08.013 | |||||
