{"created":"2023-05-15T14:38:26.281246+00:00","id":49612,"links":{},"metadata":{"_buckets":{"deposit":"528f20d2-d6c8-4fd2-b12c-0e0c7829ae4c"},"_deposit":{"created_by":1,"id":"49612","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"49612"},"status":"published"},"_oai":{"id":"oai:repo.qst.go.jp:00049612","sets":["1"]},"author_link":["501183","501181","501184","501187","501182","501186","501185"],"item_8_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2018-08","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"367","bibliographicPageStart":"361","bibliographicVolumeNumber":"131","bibliographic_titles":[{"bibliographic_title":"Reactive and Functional Polymers"}]}]},"item_8_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"We synthesized various hyperbranched polyacetals poly(t-BCRA[4]-co- BVOC), poly(t-BCRA[4]-co- BVOXP), poly(t-BCRA[4]-co-BVBC), and poly(t-BCRA[4]-co-TVCH) by the polyaddition of C-(4-t-butylbenz)calix[4]resorcinarene (t-BCRA[4]) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC), 1,3-bis(vinyloxy)propane(BVOP), 1,5-bis(vinyloxy)-3-oxapentane (BVOXP), 4,4'-bis(vinyloxy)-1,1'-bicyclohexane (BVBC), and 1,3,5,-tris(vinyloxy)cyclohexane (TVCH), respectively. The resist properties (resist sensitivies, outgassing on EUV exposure, thickness loss after soaking in aq. TMAH, and etching durability) were consistent with their structures. Overall, poly(t-BCRA[4]-co- BVOC) has a high potential as a next-generation resist material.","subitem_description_type":"Abstract"}]},"item_8_relation_14":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1016/j.reactfunctpolym.2018.08.013","subitem_relation_type_select":"DOI"}}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{"nameIdentifier":"501181","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Fukunaga, Mari"}],"nameIdentifiers":[{"nameIdentifier":"501182","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shotsuki, Kohei"}],"nameIdentifiers":[{"nameIdentifier":"501183","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Takeda, Hiroya"}],"nameIdentifiers":[{"nameIdentifier":"501184","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"山本, 洋揮"}],"nameIdentifiers":[{"nameIdentifier":"501185","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{"nameIdentifier":"501186","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"山本 洋揮","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"501187","nameIdentifierScheme":"WEKO"}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography ","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography "}]},"item_type_id":"8","owner":"1","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-02-12"},"publish_date":"2019-02-12","publish_status":"0","recid":"49612","relation_version_is_last":true,"title":["Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography "],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T23:18:58.864892+00:00"}