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{"_buckets": {"deposit": "9b49b368-03e6-4b6f-9723-3831d2fd2c70"}, "_deposit": {"created_by": 1, "id": "49229", "owners": [1], "pid": {"revision_id": 0, "type": "depid", "value": "49229"}, "status": "published"}, "_oai": {"id": "oai:repo.qst.go.jp:00049229", "sets": ["1"]}, "author_link": ["496705", "496702", "496703", "496707", "496701", "496699", "496706", "496700", "496698", "496704"], "item_8_biblio_info_7": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2018-10", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "1", "bibliographicPageEnd": "90", "bibliographicPageStart": "85", "bibliographicVolumeNumber": "31", "bibliographic_titles": [{"bibliographic_title": "Journal of Photopolymer Science and Technology"}]}]}, "item_8_description_5": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA.", "subitem_description_type": "Abstract"}]}, "item_8_publisher_8": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "the Society of Photopolymer Science and Technology"}]}, "item_8_relation_14": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type_id": {"subitem_relation_type_id_text": "10.2494/photopolymer.31.85", "subitem_relation_type_select": "DOI"}}]}, "item_8_source_id_9": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0914-9244", "subitem_source_identifier_type": "ISSN"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "metadata only access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_14cb"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "保坂, 勇志"}], "nameIdentifiers": [{"nameIdentifier": "496698", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "近藤, 孝文"}], "nameIdentifiers": [{"nameIdentifier": "496699", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "大山, 智子"}], "nameIdentifiers": [{"nameIdentifier": "496700", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "内田, 朋哉"}], "nameIdentifiers": [{"nameIdentifier": "496701", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "田口, 光正"}], "nameIdentifiers": [{"nameIdentifier": "496702", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "吉田, 陽一"}], "nameIdentifiers": [{"nameIdentifier": "496703", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "鷲尾, 方一"}], "nameIdentifiers": [{"nameIdentifier": "496704", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "保坂 勇志", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "496705", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "大山 智子", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "496706", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "田口 光正", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "496707", "nameIdentifierScheme": "WEKO"}]}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer"}]}, "item_type_id": "8", "owner": "1", "path": ["1"], "permalink_uri": "https://repo.qst.go.jp/records/49229", "pubdate": {"attribute_name": "公開日", "attribute_value": "2018-11-01"}, "publish_date": "2018-11-01", "publish_status": "0", "recid": "49229", "relation": {}, "relation_version_is_last": true, "title": ["Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer"], "weko_shared_id": -1}
  1. 原著論文

Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer

https://repo.qst.go.jp/records/49229
https://repo.qst.go.jp/records/49229
d5498b08-e8bc-4f59-901a-317a804389ae
Item type 学術雑誌論文 / Journal Article(1)
公開日 2018-11-01
タイトル
タイトル Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 保坂, 勇志

× 保坂, 勇志

WEKO 496698

保坂, 勇志

Search repository
近藤, 孝文

× 近藤, 孝文

WEKO 496699

近藤, 孝文

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大山, 智子

× 大山, 智子

WEKO 496700

大山, 智子

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内田, 朋哉

× 内田, 朋哉

WEKO 496701

内田, 朋哉

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田口, 光正

× 田口, 光正

WEKO 496702

田口, 光正

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吉田, 陽一

× 吉田, 陽一

WEKO 496703

吉田, 陽一

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鷲尾, 方一

× 鷲尾, 方一

WEKO 496704

鷲尾, 方一

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保坂 勇志

× 保坂 勇志

WEKO 496705

en 保坂 勇志

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大山 智子

× 大山 智子

WEKO 496706

en 大山 智子

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田口 光正

× 田口 光正

WEKO 496707

en 田口 光正

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抄録
内容記述タイプ Abstract
内容記述 α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA.
書誌情報 Journal of Photopolymer Science and Technology

巻 31, 号 1, p. 85-90, 発行日 2018-10
出版者
出版者 the Society of Photopolymer Science and Technology
ISSN
収録物識別子タイプ ISSN
収録物識別子 0914-9244
DOI
識別子タイプ DOI
関連識別子 10.2494/photopolymer.31.85
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