WEKO3
アイテム
Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer
https://repo.qst.go.jp/records/49229
https://repo.qst.go.jp/records/49229d5498b08-e8bc-4f59-901a-317a804389ae
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2018-11-01 | |||||
| タイトル | ||||||
| タイトル | Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
保坂, 勇志
× 保坂, 勇志× 近藤, 孝文× 大山, 智子× 内田, 朋哉× 田口, 光正× 吉田, 陽一× 鷲尾, 方一× 保坂 勇志× 大山 智子× 田口 光正 |
|||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA. | |||||
| 書誌情報 |
Journal of Photopolymer Science and Technology 巻 31, 号 1, p. 85-90, 発行日 2018-10 |
|||||
| 出版者 | ||||||
| 出版者 | the Society of Photopolymer Science and Technology | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0914-9244 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.2494/photopolymer.31.85 | |||||
