@article{oai:repo.qst.go.jp:00049229,
 author = {保坂, 勇志 and 近藤, 孝文 and 大山, 智子 and 内田, 朋哉 and 田口, 光正 and 吉田, 陽一 and 鷲尾, 方一 and 保坂 勇志 and 大山 智子 and 田口 光正},
 issue = {1},
 journal = {Journal of Photopolymer Science and Technology},
 month = {Oct},
 note = {α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA.},
 pages = {85--90},
 title = {Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer},
 volume = {31},
 year = {2018}
}