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  1. 原著論文

Ablation threshold and crater morphology of amorphous and crystalline SiO2 glass for extreme ultraviolet femtosecond pulses

https://repo.qst.go.jp/records/81079
https://repo.qst.go.jp/records/81079
de912cc6-04ac-44b0-92a4-f09c077ebc44
Item type 学術雑誌論文 / Journal Article(1)
公開日 2020-11-24
タイトル
タイトル Ablation threshold and crater morphology of amorphous and crystalline SiO2 glass for extreme ultraviolet femtosecond pulses
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Shibuya, Tatsunori

× Shibuya, Tatsunori

WEKO 1013784

Shibuya, Tatsunori

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Sakaue, Kazuyuki

× Sakaue, Kazuyuki

WEKO 1013785

Sakaue, Kazuyuki

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Ogawa , Hiroshi

× Ogawa , Hiroshi

WEKO 1013786

Ogawa , Hiroshi

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Dinh, Thanhhung

× Dinh, Thanhhung

WEKO 1013787

Dinh, Thanhhung

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Satoh, Daisuke

× Satoh, Daisuke

WEKO 1013788

Satoh, Daisuke

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Terasawa, Eichi

× Terasawa, Eichi

WEKO 1013789

Terasawa, Eichi

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Washio, Masakazu

× Washio, Masakazu

WEKO 1013790

Washio, Masakazu

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Tanaka, Masahito

× Tanaka, Masahito

WEKO 1013791

Tanaka, Masahito

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Higashiguchi, Takeshi

× Higashiguchi, Takeshi

WEKO 1013792

Higashiguchi, Takeshi

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Ishino, Masahiko

× Ishino, Masahiko

WEKO 1013793

Ishino, Masahiko

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Kubota, Yuya

× Kubota, Yuya

WEKO 1013794

Kubota, Yuya

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Inubushi, Yuichi

× Inubushi, Yuichi

WEKO 1013795

Inubushi, Yuichi

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Owada, Shigeki

× Owada, Shigeki

WEKO 1013796

Owada, Shigeki

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Nishikino, Masaharu

× Nishikino, Masaharu

WEKO 1013797

Nishikino, Masaharu

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Kobayashi, Yohei

× Kobayashi, Yohei

WEKO 1013798

Kobayashi, Yohei

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Kuroda, Ryunosuke

× Kuroda, Ryunosuke

WEKO 1013799

Kuroda, Ryunosuke

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Dinh, Thanhhung

× Dinh, Thanhhung

WEKO 1013800

en Dinh, Thanhhung

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Masahiko, Ishino

× Masahiko, Ishino

WEKO 1013801

en Masahiko, Ishino

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Masaharu, Nishikino

× Masaharu, Nishikino

WEKO 1013802

en Masaharu, Nishikino

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抄録
内容記述タイプ Abstract
内容記述 The ablation threshold fluence and crater morphology of amorphous and crystalline SiO2 glass were analyzed in the regime of an extreme ultraviolet femtosecond pulse. Despite the difference between the densities (or optical penetration depths) of amorphous and crystalline SiO2 glass, the ablation threshold fluences and crater morphologies were found to be comparable. In addition, we compared our experimental results at a 10.3 nm wavelength with those in a previous work at a 13.5 nm wavelength. We conclude that the impact of the difference in density or optical penetration depth of several tens of percent on the ablation process is limited.
書誌情報 Japanese Journal of Applied Physics

巻 59, 号 12, p. 122004, 発行日 2020-11
ISSN
収録物識別子タイプ ISSN
収録物識別子 0021-4922
DOI
識別子タイプ DOI
関連識別子 10.35848/1347-4065/abc85a
関連サイト
識別子タイプ URI
関連識別子 https://iopscience.iop.org/article/10.35848/1347-4065/abc85a
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