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  1. 原著論文

Radiation Hardness of 4H-SiC JFETs in MGy Dose Ranges

https://repo.qst.go.jp/records/80474
https://repo.qst.go.jp/records/80474
a26b5631-df58-4132-a393-526196d9fc4d
Item type 学術雑誌論文 / Journal Article(1)
公開日 2019-11-21
タイトル
タイトル Radiation Hardness of 4H-SiC JFETs in MGy Dose Ranges
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Takeyama, Akinori

× Takeyama, Akinori

WEKO 890066

Takeyama, Akinori

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Shimizu, Keigo

× Shimizu, Keigo

WEKO 890067

Shimizu, Keigo

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Makino, Takahiro

× Makino, Takahiro

WEKO 890068

Makino, Takahiro

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Yamazaki, Yuichi

× Yamazaki, Yuichi

WEKO 890069

Yamazaki, Yuichi

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Shin-Ichiro, Kuroki

× Shin-Ichiro, Kuroki

WEKO 890070

Shin-Ichiro, Kuroki

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Tanaka, Yasunori

× Tanaka, Yasunori

WEKO 890071

Tanaka, Yasunori

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 890072

Ohshima, Takeshi

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Takeyama, Akinori

× Takeyama, Akinori

WEKO 890073

en Takeyama, Akinori

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Makino, Takahiro

× Makino, Takahiro

WEKO 890074

en Makino, Takahiro

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Yamazaki, Yuichi

× Yamazaki, Yuichi

WEKO 890075

en Yamazaki, Yuichi

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 890076

en Ohshima, Takeshi

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抄録
内容記述タイプ Abstract
内容記述 Silicon carbide junction field effect transistors (SiC JFETs) were irradiated with gamma-rays up to 9 MGy (H2O). With increasing dose, apparent shift of drain current- gate voltage (ID-VG) curves to negative voltage side as observed for SiC metal oxide semiconductor (MOS) FETs did not take place. No significant difference is observed between drain and gate leakage currents of irradiated JFETs. This strongly indicates that defects as leakage paths were introduced into not bulk region but the interface between bulk and the passivation layer of SiO2. While, the transfer characteristics including threshold voltage and transconductance were slightly changed compared with the pristine sample. After drain voltage (VD) was abruptly applied to 6 V, ID at VG= 0 V increased slowly as a function of time. This indicates that variation of transfer characteristics is attributed to capture and emission process at defects generated in channel region.
書誌情報 Materials Science Forum

巻 1004, p. 1109-1114, 発行日 2020-07
出版者
出版者 Trans Tech Publications Ltd.
ISSN
収録物識別子タイプ ISSN
収録物識別子 1662-9752
DOI
識別子タイプ DOI
関連識別子 10.4028/www.scientific.net/MSF.1004.1109
関連サイト
識別子タイプ URI
関連識別子 https://www.scientific.net/MSF.1004.1109
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