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Surface processing of PMMA and metal nano-particle resist by sub-micrometer focusing of coherent extreme ultraviolet high-order harmonics pulses
https://repo.qst.go.jp/records/79993
https://repo.qst.go.jp/records/7999338cd85e5-886c-46a5-8262-d6fb4f8b65fd
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2020-04-03 | |||||
| タイトル | ||||||
| タイトル | Surface processing of PMMA and metal nano-particle resist by sub-micrometer focusing of coherent extreme ultraviolet high-order harmonics pulses | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Sakaue, Kazuyuki
× Sakaue, Kazuyuki× Motoyama, Hiroto× Hayashi, Ryosuke× Iwasaki, Atsushi× Mimura, Hidekazu× Yamanochi, Kaoru× Shibuya, Tatsunori× Ishino, Masahiko× Dinh, Thanhhung× Ogawa, Hiroshi× Higashiguchi, Takeshi× Nishikino, Masaharu× Kuroda, Ryunosuke× Ishino, Masahiko× Dinh, Thanhhung× Nishikino, Masaharu |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | We demonstrated sub-micrometer processing of two kinds of thin films, polymethyl methacrylate (PMMA) and metal nano-particle resist, by focusing high-order harmonics of near-IR femtosecond laser pulses in the extreme ultraviolet (XUV) wavelength region (27.2 – 34.3 nm) on the thin film samples using an ellipsoidal focusing mirror. The ablation threshold fluences for the PMMA sample and the metal nano-particle resist per XUV pulse obtained by the accumulation of 200 XUV pulses were determined to be 0.24 mJ/cm2 and 0.10 mJ/cm2, respectively. The diameters (FWHM) of a hole created by the ablation on the PMMA film at the focus were 0.67 and 0.44 μm along the horizontal and vertical directions, respectively. The fluence dependence of Raman microscope spectra of the processed holes on the PMMA sample showed that the chemical modification, in which C=C double bonds are formed associated with the scission of the PMMA polymer chains, is achieved by the irradiation of the XUV pulses. | |||||
| 書誌情報 |
Optics Letters 巻 45, 号 10, p. 2926-2929, 発行日 2020-06 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0146-9592 | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1364/OL.392695 | |||||
| 関連サイト | ||||||
| 識別子タイプ | URI | |||||
| 関連識別子 | https://www.osapublishing.org/ol/abstract.cfm?uri=ol-45-10-2926 | |||||
