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  1. 原著論文

Coherent strain evolution at the initial growth stage of AlN on SiC(0001) proved by in-situ synchrotron X-ray diffraction

https://repo.qst.go.jp/records/79827
https://repo.qst.go.jp/records/79827
d2849cf3-d050-4d4c-ace5-7ea2e700e7b2
Item type 学術雑誌論文 / Journal Article(1)
公開日 2020-04-08
タイトル
タイトル Coherent strain evolution at the initial growth stage of AlN on SiC(0001) proved by in-situ synchrotron X-ray diffraction
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Suzuki, Hidetoshi

× Suzuki, Hidetoshi

WEKO 866754

Suzuki, Hidetoshi

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Ishikawa, Fumitaro

× Ishikawa, Fumitaro

WEKO 866755

Ishikawa, Fumitaro

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Sasaki, Takuo

× Sasaki, Takuo

WEKO 866756

Sasaki, Takuo

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Takahashi, Masamitsu

× Takahashi, Masamitsu

WEKO 866757

Takahashi, Masamitsu

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Sasaki, Takuo

× Sasaki, Takuo

WEKO 866758

en Sasaki, Takuo

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Takahashi, Masamitsu

× Takahashi, Masamitsu

WEKO 866759

en Takahashi, Masamitsu

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抄録
内容記述タイプ Abstract
内容記述 We carry out real-time in situ synchrotron X-ray diffraction on the growth of GaN and AlN on SiC(0001) substrate by molecular beam epitaxy. At the initial growth stage of GaN/SiC or AlN/SiC heterostructure, the epitaxial overlayer develops affected by defects with the strain interaction between SiC, eventually showing characteristic lattice deformations. GaN was almost relaxed at the initial stage, showing the transition of the growth mode from 3D to 2D at around 4 nm. In contrast, AlN coherently grow on SiC(0001) at the initial stage for 13 nm concomitantly showing lattice deformation with the beneath SiC, subsequently showing gradual lattice relaxation.
書誌情報 Applied Physics Express

巻 13, p. 055501-1-055501-5, 発行日 2020-04
出版者
出版者 The Japan Society of Applied Physics
ISSN
収録物識別子タイプ ISSN
収録物識別子 1882-0778
DOI
識別子タイプ DOI
関連識別子 10.35848/1882-0786/ab84bf
関連サイト
識別子タイプ URI
関連識別子 https://iopscience.iop.org/article/10.35848/1882-0786/ab84bf
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