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Fundamental study on lithf metal oxo clusters for KrF, ArF, and electron beam lithographyographic characteristics o

https://repo.qst.go.jp/records/79723
https://repo.qst.go.jp/records/79723
13df1c6b-fdcf-4b14-8ba6-3dda8d619d76
Item type 会議発表論文 / Conference Paper(1)
公開日 2020-03-30
タイトル
タイトル Fundamental study on lithf metal oxo clusters for KrF, ArF, and electron beam lithographyographic characteristics o
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_5794
資源タイプ conference paper
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Yamamoto, Hiroki

× Yamamoto, Hiroki

WEKO 861778

Yamamoto, Hiroki

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Maekawa, Yasunari

× Maekawa, Yasunari

WEKO 861779

Maekawa, Yasunari

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Yamamoto, Hiroki

× Yamamoto, Hiroki

WEKO 861780

en Yamamoto, Hiroki

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Maekawa, Yasunari

× Maekawa, Yasunari

WEKO 861781

en Maekawa, Yasunari

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抄録
内容記述タイプ Abstract
内容記述 Some hybrid inorganic-organic resist materials known as metal-oxo clusters were synthesized and lithographic characteristics were investigated. In particular, the dissolution behaviors of metal oxo clusters were investigated by development analyzer. Our results indicated that the solubility of metal oxo clusters thin films decreased by the exposure to KrF, ArF and electron beam (EB). We clarified the sensitivity in Ti-based oxo clusters was higher than that of Zr-based oxo clusters in both KrF and ArF exposure. The dissolution rate in two kinds of metal oxo cluters was almost same in both KrF and ArF exposure. Furthermore, the dissolution contrast of Ti-based oxo clusters was higher compared to Zr-based oxo clusters. Metal oxo clusters resists have the potential as future negative tone photoresist and EB resist materials.
書誌情報 Proc. SPIE, Advances in Patterning Materials and Processes XXXVII

巻 11326, p. 113261W-1-113261W-6, 発行日 2020-03
DOI
識別子タイプ DOI
関連識別子 10.1117/12.2565717
関連サイト
識別子タイプ URI
関連識別子 https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11326/113261W/Fundamental-study-on-lithographic-characteristics-of-metal-oxo-clusters-for/10.1117/12.2565717.full
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