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  1. 原著論文

Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law

https://repo.qst.go.jp/records/79375
https://repo.qst.go.jp/records/79375
5e8b9548-7657-4b2c-89c2-adc9146ecce1
Item type 学術雑誌論文 / Journal Article(1)
公開日 2019-11-07
タイトル
タイトル Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Shimada, Yuta

× Shimada, Yuta

WEKO 1000233

Shimada, Yuta

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Kawasaki, Hiromu

× Kawasaki, Hiromu

WEKO 1000234

Kawasaki, Hiromu

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Watanabe, Kanon

× Watanabe, Kanon

WEKO 1000235

Watanabe, Kanon

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Hara, Hiroyuki

× Hara, Hiroyuki

WEKO 1000236

Hara, Hiroyuki

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Anraku, Kyoya

× Anraku, Kyoya

WEKO 1000237

Anraku, Kyoya

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Shoji, Misaki

× Shoji, Misaki

WEKO 1000238

Shoji, Misaki

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Oba, Toru

× Oba, Toru

WEKO 1000239

Oba, Toru

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Matsuda, Masaru

× Matsuda, Masaru

WEKO 1000240

Matsuda, Masaru

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Jiang, Weihua

× Jiang, Weihua

WEKO 1000241

Jiang, Weihua

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Sunahara, Atsushi

× Sunahara, Atsushi

WEKO 1000242

Sunahara, Atsushi

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Nishikino, Masaharu

× Nishikino, Masaharu

WEKO 1000243

Nishikino, Masaharu

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Namba, Shinichi

× Namba, Shinichi

WEKO 1000244

Namba, Shinichi

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Gerry, O’Sullivan

× Gerry, O’Sullivan

WEKO 1000245

Gerry, O’Sullivan

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Higashiguchi, Takeshi

× Higashiguchi, Takeshi

WEKO 1000246

Higashiguchi, Takeshi

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Masaharu, Nishikino

× Masaharu, Nishikino

WEKO 1000247

en Masaharu, Nishikino

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抄録
内容記述タイプ Abstract
内容記述 The extension of the roadmap of shorter wavelength extreme ultravi-
olet (EUV) and soft x-ray sources is a topic of considerable interest.
We have studied the optimized emission from high power and/or high
brightness sources based on unresolved transition array (UTA) emis-
sion. The peak UTA wavelengths follow a quasi-Moseley’s law for the laser wavelength of 1064 nm and λ = 165.8 × R^−1(Z − 12.44)−1.94 ∞
nm for the laser wavelength of 532 nm, respectively. The photon flux decreased with increasing atomic number. We also mapped the optimum electron temperatures and corre- sponding charge states required to produce strong soft x-ray UTA emis- sion with a photon flux of the order of 10^14 photons/nm · sr. The present quasi-Moseley’s law is sufficient for identifying the optimum element for numerous applications, such as material ablation and ionization, nano- lithography, and in vivo biological imaging.
書誌情報 AIP Advances

巻 9, 号 11, p. 115315, 発行日 2019-11
出版者
出版者 AIP Publishing
ISSN
収録物識別子タイプ ISSN
収録物識別子 2158-3226
DOI
識別子タイプ DOI
関連識別子 10.1063/1.5127943
関連サイト
識別子タイプ URI
関連識別子 https://aip.scitation.org/doi/10.1063/1.5127943
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