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Radiation Hardness of 4H-SiC JFETs in MGy Dose Ranges

https://repo.qst.go.jp/records/77085
https://repo.qst.go.jp/records/77085
40be578b-9c33-42e2-8bbf-620f2ea97466
Item type 会議発表用資料 / Presentation(1)
公開日 2019-10-07
タイトル
タイトル Radiation Hardness of 4H-SiC JFETs in MGy Dose Ranges
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_c94f
資源タイプ conference object
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Takeyama, Akinori

× Takeyama, Akinori

WEKO 792754

Takeyama, Akinori

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Shimizu, Keigo

× Shimizu, Keigo

WEKO 792755

Shimizu, Keigo

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Makino, Takahiro

× Makino, Takahiro

WEKO 792756

Makino, Takahiro

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Yamazaki, Yuichi

× Yamazaki, Yuichi

WEKO 792757

Yamazaki, Yuichi

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Shin-ichiro, Kuroki

× Shin-ichiro, Kuroki

WEKO 792758

Shin-ichiro, Kuroki

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Tanaka, Yasunori

× Tanaka, Yasunori

WEKO 792759

Tanaka, Yasunori

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 792760

Ohshima, Takeshi

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Takeyama, Akinori

× Takeyama, Akinori

WEKO 792761

en Takeyama, Akinori

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Makino, Takahiro

× Makino, Takahiro

WEKO 792762

en Makino, Takahiro

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Yamazaki, Yuichi

× Yamazaki, Yuichi

WEKO 792763

en Yamazaki, Yuichi

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 792764

en Ohshima, Takeshi

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抄録
内容記述タイプ Abstract
内容記述 Silicon carbide junction field effect transistors (SiC JFETs) were irradiated with gamma-rays up to 9 MGy (H2O). With increasing dose, apparent shift of drain current- gate voltage (ID-VG) curves to negative voltage side as observed for SiC metal oxide semiconductor (MOS) FETs did not take place. No significant difference is observed between drain and gate leakage currents of irradiated JFETs. This strongly indicates that defects as leakage paths were introduced into not bulk region but the interface between bulk and the passivation layer of SiO2. While, the transfer characteristics including threshold voltage and transconductance were slightly changed compared with the pristine sample. After drain voltage (VD) was abruptly applied to 6 V, ID at VG= 0 V increased slowly as a function of time. This indicates that variation of transfer characteristics is attributed to capture and emission process at defects generated in channel region.
会議概要(会議名, 開催地, 会期, 主催者等)
内容記述タイプ Other
内容記述 International Conference on Silicon Carbide and Related Materials (ICSCRM2019)
発表年月日
日付 2019-10-03
日付タイプ Issued
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