WEKO3
アイテム
Surface processing by femtosecond EUV laser
https://repo.qst.go.jp/records/76602
https://repo.qst.go.jp/records/76602f81acabf-03cb-45fe-9412-7708db714978
| Item type | 会議発表用資料 / Presentation(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2019-08-02 | |||||
| タイトル | ||||||
| タイトル | Surface processing by femtosecond EUV laser | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_c94f | |||||
| 資源タイプ | conference object | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
Ishino, Masahiko
× Ishino, Masahiko× Dinh, Thanhhung× Kitamura, Toshiyuki× Hasegawa, Noboru× Nishikino, Masaharu× Shibuya, Tatsunori× Sakaue, Kazuyuki× Washio, Masakazu× Higashiguchi, Takeshi× Ichimaru, Satoshi× Okamoto, Kazumasa× Kozawa, Takahiro× Suemoto, Toru× Kinoshita, Hiroo× Pikuz, Tatiana× Faenov, Anatoly× Ishino, Masahiko× Dinh, Thanhhung× Kitamura, Toshiyuki× Hasegawa, Noboru× Nishikino, Masaharu |
|||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | We have demonstrated the surface processing by use of single and multiple EUV-FEL irradiations. Ablation threshold of silica glass against femtosecond EUV pulse is 20 times smaller than that of near-IR pulse. On the surface, damage free structures are found in interaction region. We have also investigated physical process of EUV-FEL induced ablation. Damage threshold of silicon increases with absorption coefficient. From the theoretical consideration based on the experimental result, the energy sink effect may help to avoid unwanted hydrodynamic motions. As the results, we conclude that the femtosecond EUV laser is a suitable tool for highly precise processing on materials. | |||||
| 会議概要（会議名, 開催地, 会期, 主催者等） | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | SACLA Users' Meeting 2019 | |||||
| 発表年月日 | ||||||
| 日付 | 2019-08-28 | |||||
| 日付タイプ | Issued | |||||
