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  1. 原著論文

Photoluminescence properties of praseodymium ions implanted into submicron regions in gallium nitride

https://repo.qst.go.jp/records/75743
https://repo.qst.go.jp/records/75743
8b4f6cea-07d6-4799-832e-2bd329232822
Item type 学術雑誌論文 / Journal Article(1)
公開日 2019-04-26
タイトル
タイトル Photoluminescence properties of praseodymium ions implanted into submicron regions in gallium nitride
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Sato, Shinichiro

× Sato, Shinichiro

WEKO 892926

Sato, Shinichiro

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Deki, Manato

× Deki, Manato

WEKO 892927

Deki, Manato

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Nakamura, Tohru

× Nakamura, Tohru

WEKO 892928

Nakamura, Tohru

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Nishimura, Tomoaki

× Nishimura, Tomoaki

WEKO 892929

Nishimura, Tomoaki

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Stavrevski, Daniel

× Stavrevski, Daniel

WEKO 892930

Stavrevski, Daniel

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D. Greentree, Andrew

× D. Greentree, Andrew

WEKO 892931

D. Greentree, Andrew

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C. Giboson, Brant

× C. Giboson, Brant

WEKO 892932

C. Giboson, Brant

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 892933

Ohshima, Takeshi

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Sato, Shinichiro

× Sato, Shinichiro

WEKO 892934

en Sato, Shinichiro

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Ohshima, Takeshi

× Ohshima, Takeshi

WEKO 892935

en Ohshima, Takeshi

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内容記述タイプ Abstract
内容記述 Lanthanoid-doped Gallium Nitride (GaN) semiconductors are a promising class of materials with the potential to be used across a range of novel quantum optelectronic all-locations including room temperature single photon sources. However, to date there is relatively little understood about the properties of small lanthanoid ensembles, which is required before this class of materials can reach their full potential. This paper reports room temperature optical properties of submicron extent implanted-Praseodymium (Pr) in GaN. Thermal annealing at 1200 °C is conducted for the Pr implanted GaN using SiN cap technique to activate implanted-Pr as luminescent centers. The photoluminescence shows two main peaks at 650.3 and 652.0 nm originating from the 3P0 → 3F2 transition in 4f-shell of Pr3+. We explore the saturation behavior of the photoluminescence
intensity. The implanted-Pr activation ratio in a 100 nm × 100 nm region is estimated to be 1.7% in the case of 532 nm excitation.
書誌情報 Japanese Journal of Applied Physics

巻 58, 号 5, p. 051011-1-051011-6, 発行日 2019-04
出版者
出版者 IOP Science
ISSN
収録物識別子タイプ ISSN
収録物識別子 0021-4922
DOI
識別子タイプ DOI
関連識別子 10.7567/1347-4065/ab142b
関連サイト
識別子タイプ URI
関連識別子 https://iopscience.iop.org/article/10.7567/1347-4065/ab142b
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