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Development of Unitary Construction Type Beam Window for SPICE
https://repo.qst.go.jp/records/69418
https://repo.qst.go.jp/records/69418a380ea76-2b7a-4350-8537-938ffbcefce1
Item type | 会議発表用資料 / Presentation(1) | |||||
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公開日 | 2008-08-01 | |||||
タイトル | ||||||
タイトル | Development of Unitary Construction Type Beam Window for SPICE | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_c94f | |||||
資源タイプ | conference object | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
Hamano, Tsuyoshi
× Hamano, Tsuyoshi× Konishi, Teruaki× Ishikawa, Takahiro× Iso, Hiroyuki× Yasuda, Nakahiro× Suya, Noriyoshi× Imaseki, Hitoshi× 濱野 毅× 小西 輝昭× 石川 剛弘× 磯 浩之× 安田 仲宏× 酢屋 徳啓× 今関 等 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | When the microbeam exposed to the atmosphere, each particle scatters while passing through the beam window and the depth of air to the target. The scattering angles of those particles depend on the physical characteristics of the beam window, which becomes a significant factor when producing several micron diameters beam. Thus, particle-hit area also gets larger with an air gap, which is distance between the beam window and the target. In most of the microbeam cell irradiation and the analysis systems whose target positions are in the atmosphere, the Kapton of Si3N4 film is often used as the beam window and is fixed on the end of the beamline by using an epoxy type sealer or a gasket. For the fixation degree of that attaching mean is not so strong compared with the film-duct unitary construction structure, vacuum pressure influenced the shape of the film and causes to increase the air gap. In the case of SPICE(1), 1 micrometer thickness Si3N4 solid film fixed on a 1.5 mm phi hole has the gap of 290 micrometer, and the particle-hit area is calculated to be 6 micrometer. In order to achieve the beam size of 2 micrometer (2), we have developed a film and short duct unitary construction type window made by SOI wafer. Its schematic is shown in Figure 1. By using the MEMS (Micro Electro Mechanical Systems) simulation software, which can simulate the change of the shape about the semiconductor materials, and SRIM-code to derive the scattering angles, the particle-hit area was calculated to be 1 micrometer. We will make a presentation on the comparison between the results of simulation calculations and experiments. Figure 1: Schematics of unitary construction type beam window (1) H. Imaseki, et al. Nucl. Instr. Meth. B250 (7007) 81 (2)H. Yamaguchi, et al. Nucl. Instr. Meth. B230 (2003)292 |
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会議概要(会議名, 開催地, 会期, 主催者等) | ||||||
内容記述タイプ | Other | |||||
内容記述 | 11th International Conference on Nuclear Microprobe Technology and Applications | |||||
発表年月日 | ||||||
日付 | 2008-07-25 | |||||
日付タイプ | Issued |