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Synthesis of Metal Nanoparticle and Patterning in Polymeric Films Induced by Electron Beam

https://repo.qst.go.jp/records/54939
https://repo.qst.go.jp/records/54939
adef595b-d10a-4ea1-a31d-4fbe96ba59ec
アイテムタイプ 会議発表論文 / Conference Paper(1)
公開日 2019-02-22
タイトル
タイトル Synthesis of Metal Nanoparticle and Patterning in Polymeric Films Induced by Electron Beam
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_5794
資源タイプ conference paper
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 山本, 洋揮

× 山本, 洋揮

WEKO 724162

山本, 洋揮

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Kozawa, Takahiro

× Kozawa, Takahiro

WEKO 724163

Kozawa, Takahiro

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Tagawa, Seiichi

× Tagawa, Seiichi

WEKO 724164

Tagawa, Seiichi

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Marignier, Jean-Louis

× Marignier, Jean-Louis

WEKO 724165

Marignier, Jean-Louis

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Mostafavi, Mehran

× Mostafavi, Mehran

WEKO 724166

Mostafavi, Mehran

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山本 洋揮

× 山本 洋揮

WEKO 724167

en 山本 洋揮

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内容記述タイプ Abstract
内容記述 Using an electron beam, thin polymeric films loaded with metal nanoparticles of silver were prepared by a one-step irradiation-induced reduction of the metal ions embedded in the polymer. The metal nanoparticles were observed by either optical absorption or microscopy. The mechanism of the reduction of metal ions and of the polymer crosslinking were deduced from the average absorbance measurements. In view of realizing specific patterns of high resolution using the electron beam, electron beam produces 200 nm wide lines that can be separated by unexposed spaces of adjustable width, where precursors were dissolved. The resolution of the electron beam has been exploited to demonstrate the achievement of nanopatterning on polymer films using a direct-writing process. This method supplies interesting applications such as masks, replicas, or imprint molds of improved density and contrast.
書誌情報 Proc. SPIE Advances in Patterning and Processes XXXV

巻 10586, p. 105861G1-105861G10, 発行日 2018-03
DOI
識別子タイプ DOI
関連識別子 10.1117/12.2297331
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