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Synthesis of Metal Nanoparticle and Patterning in Polymeric Films Induced by Electron Beam
https://repo.qst.go.jp/records/54939
https://repo.qst.go.jp/records/54939adef595b-d10a-4ea1-a31d-4fbe96ba59ec
Item type | 会議発表論文 / Conference Paper(1) | |||||
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公開日 | 2019-02-22 | |||||
タイトル | ||||||
タイトル | Synthesis of Metal Nanoparticle and Patterning in Polymeric Films Induced by Electron Beam | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_5794 | |||||
資源タイプ | conference paper | |||||
アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
著者 |
山本, 洋揮
× 山本, 洋揮× Kozawa, Takahiro× Tagawa, Seiichi× Marignier, Jean-Louis× Mostafavi, Mehran× 山本 洋揮 |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Using an electron beam, thin polymeric films loaded with metal nanoparticles of silver were prepared by a one-step irradiation-induced reduction of the metal ions embedded in the polymer. The metal nanoparticles were observed by either optical absorption or microscopy. The mechanism of the reduction of metal ions and of the polymer crosslinking were deduced from the average absorbance measurements. In view of realizing specific patterns of high resolution using the electron beam, electron beam produces 200 nm wide lines that can be separated by unexposed spaces of adjustable width, where precursors were dissolved. The resolution of the electron beam has been exploited to demonstrate the achievement of nanopatterning on polymer films using a direct-writing process. This method supplies interesting applications such as masks, replicas, or imprint molds of improved density and contrast. | |||||
書誌情報 |
Proc. SPIE Advances in Patterning and Processes XXXV 巻 10586, p. 105861G1-105861G10, 発行日 2018-03 |
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DOI | ||||||
識別子タイプ | DOI | |||||
関連識別子 | 10.1117/12.2297331 |