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In situ synchrotron X-ray diffraction study on epitaxial-growth dynamics of III–V semiconductors

https://repo.qst.go.jp/records/49163
https://repo.qst.go.jp/records/49163
1864d005-47bc-4f60-8b57-c68c551a9f86
Item type 学術雑誌論文 / Journal Article(1)
公開日 2018-09-07
タイトル
タイトル In situ synchrotron X-ray diffraction study on epitaxial-growth dynamics of III–V semiconductors
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 高橋, 正光

× 高橋, 正光

WEKO 496032

高橋, 正光

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高橋 正光

× 高橋 正光

WEKO 496033

en 高橋 正光

Search repository
抄録
内容記述タイプ Abstract
内容記述 The application of in situ synchrotron X-ray diffraction (XRD) to the molecular-beam epitaxial (MBE) growth of III–V semiconductors is overviewed along with backgrounds of the diffraction theory and instrumentation. X-rays are sensitive not only to the surface of growing films but also to buried interfacial structures because of their large penetration depth. Moreover, a spatial coherence length up to μm order makes X-rays widely applicable to the characterization of low-dimensional structures, such as quantum dots and wires. In situ XRD studies during growth were performed using an X-ray diffractometer, which was combined with an MBE chamber. X-ray reciprocal space mapping at a speed matching a typical growth rate was achieved using intense X-rays available from a synchrotron light source and an area detector. The importance of measuring the three-dimensional distribution of XRD intensity in a reciprocal space map is demonstrated for the MBE growth of two-, one-, and zero-dimensional structures. A large amount of information about the growth process of two-dimensional InGaAs/GaAs(001) epitaxial films has been provided by three-dimensional X-ray reciprocal mappings, including the anisotropic strain relaxation, the compositional inhomogeneity, and the evolution of surface and interfacial roughness. For one-dimensional GaAs nanowires grown in a Au-catalyzed vapor-liquid–solid mode, the relationship between the diameter of the nanowires and the formation of polytypes has been suggested on the basis of in situ XRD measurements. In situ three-dimensional X-ray reciprocal space mapping is also shown to be useful for determining the lateral and vertical sizes of self-assembled InAs/GaAs(001) quantum dots as well as their internal strain distributions during growth.
書誌情報 Japanese Journal of Applied Physics

巻 57, p. 050101, 発行日 2018-04
DOI
識別子タイプ DOI
関連識別子 10.7567/JJAP.57.050101
関連サイト
識別子タイプ DOI
関連識別子 https://doi.org/10.7567/JJAP.57.050101
関連名称 https://doi.org/10.7567/JJAP.57.050101
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