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  1. 原著論文

Effect of plasma formation on the double pulse laser excitation of cubic silicon carbide

https://repo.qst.go.jp/records/48498
https://repo.qst.go.jp/records/48498
ded344fd-ae14-41ee-a2a8-b98c91dbd215
Item type 学術雑誌論文 / Journal Article(1)
公開日 2018-02-14
タイトル
タイトル Effect of plasma formation on the double pulse laser excitation of cubic silicon carbide
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 乙部, 智仁

× 乙部, 智仁

WEKO 487566

乙部, 智仁

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林, 照剛

× 林, 照剛

WEKO 487567

林, 照剛

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錦野, 将元

× 錦野, 将元

WEKO 487568

錦野, 将元

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乙部 智仁

× 乙部 智仁

WEKO 487569

en 乙部 智仁

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錦野 将元

× 錦野 将元

WEKO 487570

en 錦野 将元

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内容記述タイプ Abstract
内容記述 We calculate the electron excitation in cubic silicon carbide (3C-SiC) caused by the intense femtosecond laser double pulses using time-dependent density functional theory (TDDFT). After the first pulse ends, excited electrons should be relaxed by the collisional processes.Because TDDFT dose not include the scattering processes, the thermalization is mimicked by following three assumptions.
First, we assume no collisions and relaxation processes. Second, we assume the partially thermalized electronic state defined by two quasi-temperatures in the conduction and valence bands individually. Third, we assume the thermalized electron distribution, which is expressed by single electron temperature. Our results indicate that the plasma frequency formed by the first pulse is the key parameter in energy absorption in the second pulse. When the plasma frequency is comparable to the frequency of the laser, the energy absorption in the second pulse shows maximum. The lower electron temperature shows higher plasma frequency and higher efficient energy absorption, because the effective mass of electron becomes smaller.
書誌情報 Applied Physics Letters

巻 111, 号 17, p. 171107-1-171107-4, 発行日 2017-10
出版者
出版者 American Institute of Physics
DOI
識別子タイプ DOI
関連識別子 10.1063/1.4997363
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