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THz pulse generation using a contact grating device composed of TiO2/SiO2 thin films on LiNbO3 crystal
https://repo.qst.go.jp/records/48004
https://repo.qst.go.jp/records/48004daa5480b-0e1e-4f90-b3bc-8e61e051f5ab
| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2017-06-05 | |||||
| タイトル | ||||||
| タイトル | THz pulse generation using a contact grating device composed of TiO2/SiO2 thin films on LiNbO3 crystal | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| アクセス権 | ||||||
| アクセス権 | metadata only access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
| 著者 |
吉田, 芙美子
× 吉田, 芙美子× 永島, 圭介× 坪内, 雅明× 圓山, 桃子× 越智, 義浩× 吉田 芙美子× 永島 圭介× 坪内 雅明× 圓山 桃子× 越智 義浩 |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | We developed a new contact grating device for terahertz (THz) pulse generation by optical rectification. The device was made from polycrystalline rutile TiO2 thin film in the grating region and an amorphous SiO2 layer deposited on a Mg-doped LiNbO3 crystal. Our calculations indicated that the TiO2 grating on the SiO2 layer would yield an increase in diffraction efficiency of up to 0.69. The prepared TiO2 thin film had a sufficient laser induced damage threshold (140GW/cm2) to enable effective THz pulse generation. Using a prototype device, we demonstrated THz pulse generation and investigated the phase-matching conditions experimentally. | |||||
| 書誌情報 |
Journal of Applied Physics 巻 120, 号 18, p. 183103-1-183103-5, 発行日 2016-11 |
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| 出版者 | ||||||
| 出版者 | AIP publishing | |||||
| DOI | ||||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1063/1.4967533 | |||||
| 関連サイト | ||||||
| 識別子タイプ | URI | |||||
| 関連識別子 | http://scitation.aip.org/content/aip/journal/jap/120/18/10.1063/1.4967533 | |||||
| 関連名称 | http://scitation.aip.org/content/aip/journal/jap/120/18/10.1063/1.4967533 | |||||
