ログイン
Language:

WEKO3

  • トップ
  • ランキング
To
lat lon distance
To

Field does not validate



インデックスリンク

インデックスツリー

メールアドレスを入力してください。

WEKO

One fine body…

WEKO

One fine body…

アイテム

  1. 原著論文

ECE Laboratory in the Vinca institute - its basic characteristics and fundamentals of electrochemical etching on polycarbonate

https://repo.qst.go.jp/records/43436
https://repo.qst.go.jp/records/43436
ff8b3a79-0d09-4a0d-a4a3-30b5f1ee5e81
アイテムタイプ 学術雑誌論文 / Journal Article(1)
公開日 2004-07-01
タイトル
タイトル ECE Laboratory in the Vinca institute - its basic characteristics and fundamentals of electrochemical etching on polycarbonate
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
アクセス権
アクセス権 metadata only access
アクセス権URI http://purl.org/coar/access_right/c_14cb
著者 Zunic, Zora

× Zunic, Zora

WEKO 431968

Zunic, Zora

Search repository
Ujic, Predrag

× Ujic, Predrag

WEKO 431969

Ujic, Predrag

Search repository
Celikovic, Igor

× Celikovic, Igor

WEKO 431970

Celikovic, Igor

Search repository
Fujimoto, Kenzo

× Fujimoto, Kenzo

WEKO 431971

Fujimoto, Kenzo

Search repository
藤元 憲三

× 藤元 憲三

WEKO 431972

en 藤元 憲三

Search repository
抄録
内容記述タイプ Abstract
内容記述 This paper deals with the introductory aspects of the Electrochemical Etching Laboratory installed at the Vinca Institute in the year 2003. The main purpose of the laboratory is its field application for radon and thoron large-scale survey using passive radon/thron UFO type detectors. Since the etching techniques together with the laboratory equipment were transferred from the National Institute of Radiological Sciences, Chiba, Japan., it was necessary for both etching conditions to be confirmed and to be checked up, i.e., bulk etching speeds of chemical etching and electrochemical etching in the VINCA Electrochemical Etching Laboratry itself. Beside this initial step, other concerns were taken into consideration in this preliminary experimental phase such as the following: the measurable energy range of the polycarbonate film, background etch pit density of the film and its standard deviation and reproducibility of the response to alpha particles for different sets of etchings
書誌情報 Nuclear Technology & Radiation Protection

巻 XVIII, 号 2, p. 57-60, 発行日 2003-12
戻る
0
views
See details
Views

Versions

Ver.1 2023-05-16 00:27:19.475972
Show All versions

Share

Share
tweet

Cite as

Other

print

エクスポート

OAI-PMH
  • OAI-PMH JPCOAR 2.0
  • OAI-PMH JPCOAR 1.0
  • OAI-PMH DublinCore
  • OAI-PMH DDI
Other Formats
  • JSON
  • BIBTEX
  • ZIP

コミュニティ

確認

確認

確認


Powered by WEKO3


Powered by WEKO3