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Effect of component of cinnamic acid-stabilized ZrO2 nanoparticle resists on resist performance for EB and EUV lithography
https://repo.qst.go.jp/records/2002950
https://repo.qst.go.jp/records/2002950ed5283a3-9f82-49bc-8756-22ccc8143b96
| アイテムタイプ | 学術雑誌論文 / Journal Article(1) | |||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 公開日 | 2026-03-05 | |||||||||||
| タイトル | ||||||||||||
| タイトル | Effect of component of cinnamic acid-stabilized ZrO2 nanoparticle resists on resist performance for EB and EUV lithography | |||||||||||
| 言語 | en | |||||||||||
| 言語 | ||||||||||||
| 言語 | eng | |||||||||||
| 資源タイプ | ||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||
| 資源タイプ | journal article | |||||||||||
| 著者 |
Hamada Takashi
× Hamada Takashi
× shuhei shimoda
× Yamamoto Hiroki
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| 抄録 | ||||||||||||
| 内容記述タイプ | Abstract | |||||||||||
| 内容記述 | trans-Cinnamic acid-stabilized ZrO₂ nanoparticles were synthesized by hydrolysis and polycondensation of zirconium tetrapropoxide in the presence of trans cinnamic acid. TEM showed 5–10 nm particles. The nanoparticles dissolved well in polar solvents, with solubility depending on the amount of cinnamic acid. trans-Cinnamic acid-stabilized ZrO₂ nanoparticles functioned as negative tone electron beam resists with sensitivities of 1.1-2.6 mC/cm² and achieved 30–50 nm resolution. trans-Cinnamic acid-stabilized ZrO₂ nanoparticles also responded to EUV, though with low sensitivity. Zirconium content and ligand structure influenced solubility, particle size, and EB/EUV lithography performance. | |||||||||||
| 書誌情報 |
Japanese Journal of Applied Physics 発行日 2026-03 |
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| DOI | ||||||||||||
| 識別子タイプ | DOI | |||||||||||
| 関連識別子 | 10.35848/1347-4065/ae4d53 | |||||||||||
