| アイテムタイプ |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2025-02-20 |
| タイトル |
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タイトル |
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure |
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言語 |
en |
| 言語 |
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言語 |
eng |
| 資源タイプ |
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資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
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資源タイプ |
journal article |
| 著者 |
Yosuke Ohta
Atsushi Sekiguchi
Shinji Yamakawa
Tetsuo Harada
Takeo Watanabe
Yamamoto Hiroki
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| 抄録 |
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内容記述タイプ |
Abstract |
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内容記述 |
It has been reported that the good correlation in sensitivity and resolution between EUV exposure and EB exposure because of the similar mechanism of the photochemical-reaction in photoresists during exposure. However, in the early stages of EUV resist development, there are problems on the points of the cost and time-consuming to evaluate all EUV resist materials by EB exposure. Therefore, we investigated the possibility of using KrF exposure as the initial screening of EUV resists. In former report, we evaluated the correlation of
sensitivity between KrF and EUV exposure, KrF and EB exposure, EB and EUV exposure respectively by using various type of resists. Then we could find there is some correlation between each exposure. In this report, we formulated some types of KrF resist and investigated whether there is a correlation of sensitivity between KrF and EUV exposures. |
| 書誌情報 |
Journal of Photopolymer Science and Technology
巻 37,
号 1,
p. 89-93,
発行日 2024-04
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| DOI |
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識別子タイプ |
DOI |
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関連識別子 |
10.2494/photopolymer.37.89 |
