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  1. 原著論文

Transient Swelling During Development of Poly(methyl methacrylate) Resist

https://repo.qst.go.jp/records/2001502
https://repo.qst.go.jp/records/2001502
784ac8b7-e6b1-40ba-9208-055df306465b
アイテムタイプ 学術雑誌論文 / Journal Article(1)
公開日 2025-02-20
タイトル
タイトル Transient Swelling During Development of Poly(methyl methacrylate) Resist
言語 ja
言語
言語 jpn
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
著者 誉田 明宏

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誉田 明宏

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山本 洋揮

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山本 洋揮

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Shusuke Yoshitake

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Shusuke Yoshitake

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Takahiro Kozawa

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Takahiro Kozawa

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内容記述タイプ Abstract
内容記述 For the realization of further miniaturization at scale of 10 nm and below in semiconductor devices, it is essential to understand the dissolution kinetics of resist films in developer. In this study, the change in molecular weight and dissolution kinetics induced by ionizing radiation in poly(methyl methacrylate) (PMMA) resist films were studied using a quartz crystal microbalance method and gel permeation chromatography. The weight-averaged molecular weight Mw was changed from 50000 to 996000. Three types of developers (o-xylene and 1:3 and 1:7 mixing solutions of methyl isobutyl ketone and isopropanol) were
examined. The kinetics during the development of PMMA films was classified into three patterns. In low Mw region, only dissolution was observed. In middle Mw region, both swelling and dissolution were observed. In high Mw region, only swelling was observed. The boundaries between regions were dependent of the developer and independent of the initial molecular weight of PMMA.
書誌情報 Journal of Photopolymer Science and Technology

巻 37, 号 1, p. 8188, 発行日 2024-02
DOI
識別子タイプ DOI
関連識別子 10.2494/photopolymer.37.81
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